4 Papers
Junsheng Yu is an academic researcher from University of Electronic Science and Technology of China. The author has contributed to research in topics: Moiré pattern & Engineering. The author has an hindex of 3, co-authored 4 publications.
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Papers
Four-quadrant gratings moiré fringe alignment measurement in proximity lithography
Jiangping Zhu,Song Hu,Junsheng Yu,Shaolin Zhou,Yan Tang,Min Zhong,Lixin Zhao,Minyong Chen,Lanlan Li,Yu He,Wei Jiang +10 more
TL;DR: A four-quadrant gratings alignment method benefiting from phase demodulation for proximity lithography, which combines the advantages of interferometry with image processing, which enhances the technological adaptability.
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Influence of tilt moiré fringe on alignment accuracy in proximity lithography
Jiangping Zhu,Jiangping Zhu,Song Hu,Junsheng Yu,Yan Tang,Feng Xu,Yu He,Shaolin Zhou,Lanlan Li +8 more
TL;DR: In this article, a dual gratings-based alignment method was proposed to measure the relative linear displacement between the mask and the wafer, which can be applied to lithography and other correlated fields, and the analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire fringes with different tilt angles have different influences on the alignment accuracy.
30
Effects of grating marks parameters on lithography alignment precision
Jiangping Zhu,Jiangping Zhu,Jiangping Zhu,Song Hu,Junsheng Yu +4 more
- 20 Nov 2012
TL;DR: In this article, the effects of grating marks parameters on alignment precision and scope were investigated in the lithography alignment method based on moire fringe, gratings are especially used as alignment marks.
3
Experimental study of Talbot imaging moiré-based lithography alignment method
TL;DR: In this paper, a four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level, where the alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave.