35 Papers
154 Citations
Jungjae Park is an academic researcher from Korea Research Institute of Standards and Science. The author has contributed to research in topics: Interferometry & Refractive index. The author has an hindex of 10, co-authored 35 publications. Previous affiliations of Jungjae Park include National Institute of Standards and Technology & KAIST.
Chat about Author
Papers
A Review of Thickness Measurements of Thick Transparent Layers Using Optical Interferometry
TL;DR: In this article, a review of optical interferometric methods for measuring thicknesses of thick transparent layers are introduced through a discussion of basic principles and applications, with consideration of optical layouts and analysis methods of interference signals.
81
Vibration-insensitive measurements of the thickness profile of large glass panels.
TL;DR: A modified spectral-domain interferometer to measure the physical thickness profile and group refractive index distribution of a large glass substrate simultaneously and to verify the insensitivity to vibration is proposed.
37
Vibration-desensitized interferometer by continuous phase shifting with high-speed fringe capturing
Jungjae Park,Seung-Woo Kim +1 more
TL;DR: A continuous phase-shifting method is described, which implements phase shifting uninterruptedly while capturing resulting interference fringes at a high rate, thereby being recovered free from vibration by Fourier-based postprocessing.
30
Fizeau-type interferometric probe to measure geometrical thickness of silicon wafers
TL;DR: An optical interferometric probe for measuring the geometrical thickness and refractive index of silicon wafers based on a Fizeau-type spectral-domain interferometer, as realized by adopting the optical fiber components of a circulator and a sheet-type beam splitter to achieve a much simpler optical composition and higher immunity to air fluctuations.
29
Modified Roberts-Langenbeck test for measuring thickness and refractive index variation of silicon wafers
TL;DR: A method to simultaneously measure thickness variation and refractive index homogeneity of 300 mm diameter silicon wafers using a wavelength-shifting Fizeau interferometer operating at 1550 nm is described.
28