Jung-Sik Kim
Purdue University
3 Papers
29 Citations
Jung-Sik Kim is an academic researcher from Purdue University. The author has contributed to research in topics: Engineering & Adsorption. The author has an hindex of 1, co-authored 1 publications.
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Papers
Stability Diagram for the System Yba2Cu3O7–x
Jung-Sik Kim,David R. Gaskell +1 more
TL;DR: The dependence of the degree of nonstoichiometry of YBa2Cu307x (123) on temperature and oxygen pressure has been determined by thermogravimetric analysis (TGA) in the temperature range 400° to 950°C and the oxygen pressure range 10−6 to 1 atm (1 atm = 105 Pa) as mentioned in this paper.
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Modeling of deposit formation in mesoporous substrates via atomic layer deposition: insights from pore‐scale simulation
Hao Gu,Dennis T. Lee,Peter Corkery,Yurun Miao,Jung-Sik Kim,Yuchen Yuan,Zhen-Liang Xu,Gance Dai,Gregory N. Parsons,Ioannis G. Kevrekidis,Liwei Zhuang,Michael Tsapatsis +11 more
TL;DR: In this article , the authors extended their earlier modeling effort considering the coexistence of ALD both inside the pores and on the external surface of the substrate and designed a modified ALD process and examined the performance of the corresponding LIPS membranes.
Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten
TL;DR: In this article , the authors identify process requirements to sequentially combine two intrinsic area-selective deposition (ASD) processes: (1) poly(3,4-ethylenedioxythiophene) (PEDOT) ASD on SiO2 vs Si-H via oxidative chemical vapor deposition and (2) W ASD on si-H vs Si O2 via atomic layer deposition.