Johan Das
Katholieke Universiteit Leuven
22 Papers
262 Citations
Johan Das is an academic researcher from Katholieke Universiteit Leuven. The author has contributed to research in topics: Semiconductor & High-electron-mobility transistor. The author has an hindex of 10, co-authored 22 publications.
Chat about Author
Papers
On-chip manipulation and magnetization assessment of magnetic bead ensembles by integrated spin-valve sensors
Liesbet Lagae,Roel Wirix-Speetjens,Johan Das,D.L. Graham,Hugo Ferreira,Ppf Freitas,Gustaaf Borghs,J. De Boeck +7 more
TL;DR: In this paper, a spin-valve sensor was integrated with magnetic field generating conductors to assess the behavior of ensembles of superparamagnetic nanoparticles 300 nm in diameter that contain 75% to 80% magnetite.
109
Patent
Method for producing a semiconductor device and resulting device
Johan Das,Wouter Ruythooren +1 more
- 30 Jan 2006
TL;DR: In this paper, the authors proposed a method of producing a semiconductor device and the resulting device is suitable in the first place for producing high power devices such as High Electron Mobility Transistors (HEMT), in particular HEMT-devices with multiples source-gate-drain groups or multiple base bipolar transistors.
25
InAs/(Al,Ga)Sb quantum well structures for magnetic sensors
TL;DR: In this paper, the fabrication and characterization of Hall and magnetoresistive sensors with high sensitivity and good temperature stability, InAs/AlGaSb quantum well structures grown by molecular beam epitaxy (MBE) on semiinsulating GaAs substrates were used as active layers for magnetic field sensing.
22
Substrate removal of AlGaN/GaN HEMTs using laser lift‐off
TL;DR: In this paper, the authors proposed to remove the sapphire substrate after the HEMT processing to improve the thermal management of the AlGaN/GaN high electron mobility transistors.
18
Surface stabilization for higher performance AlGaN/GaN HEMT with in-situ movpe sin
Marianne Germain,Maarten Leys,Joff Derluyn,Steven Boeykens,Stefan Degroote,Wouter Ruythooren,Johan Das,Raf Vandersmissen,Dongping Xiao,Wenfei Wang,Gustaaf Borghs +10 more
TL;DR: In this paper, a SiN layer is grown at high temperature in-situ, i.e. in the MOCVD reactor prior to unloading the HEMT epiwafers.
16