Jiebin Niu
Fudan University
7 Papers
24 Citations
Jiebin Niu is an academic researcher from Fudan University. The author has contributed to research in topics: Etching (microfabrication) & Photoresist. The author has an hindex of 5, co-authored 7 publications. Previous affiliations of Jiebin Niu include Chinese Academy of Sciences.
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Papers
Chemical ordering suppresses large-scale electronic phase separation in doped manganites
Yinyan Zhu,Kai Du,Jiebin Niu,Jiebin Niu,Ling-Fang Lin,Wengang Wei,Hao Liu,Hanxuan Lin,Kai A. I. Zhang,Tieying Yang,Yunfang Kou,Jian Shao,Xingyu Gao,Xiaoshan Xu,Xiaoshan Wu,Shuai Dong,Lifeng Yin,Jian Shen +17 more
TL;DR: This work determines the role of chemical ordering of the Pr dopant in a colossal magnetoresistant (La1−yPry)1−xCaxMnO3 (LPCMO) system, which has been well known for its large length-scale electronic phase separation phenomena.
Emerging single-phase state in small manganite nanodisks
Jian Shao,Hao Liu,Kai A. I. Zhang,Yang Yu,Weichao Yu,Hanxuan Lin,Jiebin Niu,Kai Du,Yunfang Kou,Wengang Wei,Fanli Lan,Yinyan Zhu,Wenbin Wang,Jiang Xiao,Lifeng Yin,E. W. Plummer,Jian Shen +16 more
TL;DR: A surprising transition from the EPS state to a single phase state when the spatial size of the system is smaller than the characteristic length scale of EPS is shown, which paves a way to manipulate EPS, which is potentially useful for oxides electronic and spintronic device applications.
24
Patent
Manufacture method of extreme ultraviolet mask
Jiebin Niu,Yin Lifeng,Shen Jian +2 more
- 30 Nov 2016
TL;DR: In this paper, an extreme ultraviolet mask which simultaneously owns the nanoscale graph with high resolution and a large-area micrometer scale graph with low resolution can be manufactured only on the basis of laser direct writing technology.
4
Patent
Method for patterning colossal magnetoresistance manganese oxide thin film on nanoscale
Jiebin Niu,Yin Lifeng,Shen Jian +2 more
- 21 Dec 2016
TL;DR: In this paper, a method for patterning a colossal magnetoresistance manganese oxide thin film on a nanoscale was proposed, which consists of firstly carrying out spin-coating of electron beam photoresist on a strontium titanate substrate, carrying out baking and then exposing a required nano-nano graphic layout by using of an electron beam direct writing lithography; carrying out developing and fixing, obtaining a resist mask graphic of a required micro-scale graphic, depositing an aluminum metal thin film and then removing the resist to strip out an aluminum
1
Unexpected Intermediate State Photoinduced in the Metal-Insulator Transition of Submicrometer Phase-Separated Manganites.
Hanxuan Lin,Hao Liu,Ling-Fang Lin,Shuai Dong,Hongyan Chen,Yu Bai,Tian Miao,Yang Yu,Weichao Yu,Jing Tang,Yinyan Zhu,Yunfang Kou,Jiebin Niu,Zhao-Hua Cheng,Jiang Xiao,Wenbin Wang,Elbio Dagotto,Elbio Dagotto,Lifeng Yin,Jian Shen +19 more
TL;DR: Using magnetic force microscopy and time-dependent magneto-optical Kerr effect, it is determined that the third state is a nanoscale mixture of the competing ferromagnetic metallic and charge-ordered insulating phases, with its own physical properties.