Disclosed is an LCD apparatus having a reduced size and weight. The LCD apparatus includes a bottom chassis having a bottom surface and first to fourth sidewalls. The sidewall of the bottom chassis includes a supporting member for preventing a light guiding plate from being moved and a fixing boss for fixing an optical sheet. The bottom chassis includes a lamp insertion portion for receiving a lamp unit, which is disposed on the third and fourth sidewalls of the bottom chassis. The bottom chassis receives a reflecting plate, the light guiding plate and the optical sheet. A mold frame is coupled to the bottom chassis to fix the reflecting plate, the light guiding plate and the optical sheet to the bottom chassis. A display unit disposed on the mold frame is fixed to the mold frame by a top chassis coupled to the mold frame. Accordingly, a bottom mold frame for receiving a backlight assembly is removed, so that it is able to reduce a cost of the LCD apparatus and a weight thereof.

Liquid crystal display apparatus

A method of making a solid element device that includes a solid element, an element mount part on which the solid element is mounted and which has a thermal conductivity of not less than 100 W/mK, an external terminal provided separately from the element mount part and electrically connected to the solid element, and a glass sealing part directly contacting and covering the solid element for sealing the solid element, includes pressing a glass material at a temperature higher than a yield point of the glass material for forming the glass sealing part.

Solid element device and method for manufacturing the same

There is provided a liquid crystal lens element having a lens function capable of performing spherical aberration correction including a power component equivalent to a focal point change of the stable incident light in accordance with the voltage applied. One (12) of the two transparent substrates (11, 12) has a transparent electrode (15) and a Fresnel lens surface (17) while the other (11) of the two transparent substrates has a phase correction surface (18) and a transparent electrode (16). Thus, by arranging the Fresnel lens surface (17) and the liquid crystal layer (13) between the two transparent electrodes (15, 16), the substantial refraction factor distribution of the liquid crystal layer (13) is changed according to the voltage applied, so that positive/negative power is given to the wavefront transmitting through the liquid crystal layer (13), the Fresnel lens surface (17), and the phase correction surface (18).

Liquid crystal lens element and optical head device

In general, in one aspect, the invention features methods that include forming a roll of a first material into a substrate and forming a plurality of rows of a second material on the substrate, where the second material includes a metal, the rows of the second material extend along a first direction, the rows are spaced apart from one another, and adjacent rows are spaced apart by about 400 nm or less.

Polarizer films and methods of making the same

Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.

Optical films and methods of making the same

In certain aspects, the invention features articles that have a first layer including a plurality of rows of a first material extending along a first direction, the rows being spaced apart from each other and a center of each adjacent row being separated by a distance less than a wavelength λ, and a second layer supported by the first layer, the second layer including a second material. The first layer is configured to transmit about 50% or more of radiation of wavelength λ having a first polarization state incident on the first layer along a path and to specularly reflect about 80% or more of radiation of wavelength λ having a second polarization state incident on the first layer along the path, the first and second polarization states being orthogonal. The second layer is configured so that the article specularly reflects about 10% or less of the radiation of wavelength λ having the second polarization incident on the article along the path, where the path intersects the first and second layers.

Structures for polarization and beam control

A multilayer film defining an optical axis, wherein the optical filter transmits 50% of light having a wavelength λ1 propagating along the optical axis, and the optical filter transmits 50% of light having a wavelength λ2 incident on the multilayer film at an angle of 30 degrees with respect to the optical axis, wherein |λ1 - λ2| is about 30 nm or less.

Films for optical use and methods of making such films

A birefringent device of substantially uniform thickness less than about 10 microns, and being suitable for operating in a wavelength range about a central wavelength is disclosed. The device includes a base substrate, a layer of periodic index regions of alternating refractive indices applied to a first surface of the base substrate, and a cap substrate located substantially adjacent to the layer distal to the base substrate. The layer of periodic index regions has a periodicity of less than the central wavelength. The device being suitable to produce an arbitrary phase retardation between 0 and 2 π phase.

Precision phase retardation devices and method of making same

A radiation polarizer, controller, and a method of radiation polarization and beam control are disclosed. The radiation polarizer (10) includes a substrate (14), at least one anti-reflection coating layer (32) communicatively coupled to the substrate, at least two nanostructures (22) communicatively coupled to the at least one anti-reflection coating layer, and at least two groove layers (20), wherein each one of the at least two groove layers is interstitial to a respective one of the at least two nanostructures. The method may include the steps of communicatively coupling at least one anti-reflection coating layer to a substrate, communicatively coupling at least two nanostructures to at least one of the at least one anti-reflection coating layer, providing interstitially to a respective one of the at least two nanostructures at least two groove layers, coupling the at least two groove layers and the at least two nanostructures to provide a pass wavelength in the range of about 250 nm to less than about a microwave wavelength, and allowing for examining of radiation having a wavelength in a range of about 250 nm to less than about a microwave wavelength, and having an electric field orthogonal to the at least two groove layers, by allowing for a passing of the radiation through said coupling of the at least two groove layers and the at least two nanostructures.

Method and system for providing beam polarization

Major defects encountered in nanoimprint lithography (NIL) process, especially particle and gap associated defects are studied in this article. Unlike in other lithography, a particle induced defect in NIL is larger than the particle itself. To remove the particles, a dry clean process for the nanostructure-patterned surface is explored. The gap-associated defect is a unique phenomenon in NIL, which is induced by the incomplete contact between mold and substrate. The pressure required to eliminate voids during the NIL process is discussed. Based on the studies, both visual particle and void associated defects free 4in. and even larger wafers are achieved.

Defect control in nanoimprint lithography

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