Jian Hao Chen
National Chiao Tung University
16 Papers
156 Citations
Jian Hao Chen is an academic researcher from National Chiao Tung University. The author has contributed to research in topics: Non-volatile memory & Bit cell. The author has an hindex of 6, co-authored 11 publications.
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Papers
Suppression of interfacial reaction for HfO2 on silicon by pre-CF4 plasma treatment
Chao-Sung Lai,Woei Cherng Wu,Tien-Sheng Chao,Jian Hao Chen,Jer-Chyi Wang,Li-Lin Tay,Nelson Rowell +6 more
TL;DR: In this article, the effects of pre-CF4 plasma treatment on Si for sputtered HfO2 gate dielectrics are investigated, and the significant fluorine atoms blocking oxygen diffusion through the Hf2 film into the Si substrate.
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Highly Reliable Multilevel and 2-bit/cell Operation of Wrapped Select Gate (WSG) SONOS Memory
Woei-Cherng Wu,Tien-Sheng Chao,Wu-Chin Peng,Wen Luh Yang,Jer-Chyi Wang,Jian Hao Chen,Chao-Sung Lai,Tsung-Yu Yang,Chien-Hsing Lee,Tsung-Min Hsieh,Jhyy Cheng Liou +10 more
TL;DR: In this article, a WSG-SONOS memory with a multilevel and 2-bit/cell operation has been successfully demonstrated, which can be used in future high-density and high-performance memory application.
High-Performance HfO2 Gate Dielectrics Fluorinated by Postdeposition CF4 Plasma Treatment
TL;DR: Wu et al. as mentioned in this paper proposed a high-performance HfO2 gate dielectrics fluorinated by postdeposition CF4 plasminization for the Taiwan Nanya Technology Corporation.
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Giant electrically tunable magnon transport anisotropy in a van der Waals antiferromagnetic insulator
Shaomian Qi,Di Chen,Kangyao Chen,Jianqiao Liu,Guangyi Chen,Linhao Jia,Jiankun Li,Mingcai Huang,Yuan-Jhe Song,Shiying Han,Lianming Tong,P. F. Yu,Yi Liu,Hongyu Wu,Shiwei Wu,Jiang Xiao,Ryuichi Shindou,Xincheng Xie,Jian Hao Chen +18 more
TL;DR: In this article , the authors demonstrated the potential of 2D anisotropic van der Waals magnons for information storage and processing, where information is inscribed by the anisotropy of magnon transport in CrPS 4 .
Si Nanocrystal Memory Devices Self-Assembled by In Situ Rapid Thermal Annealing of Ultrathin a -Si on SiO2
TL;DR: Si-nanocrystal memories have been fabricated using the thermal agglomeration of an ultrathin (0.9-3.5 nm) amorphous Si (a-Si) film as mentioned in this paper.
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