Jasper Menger
ASML Holding
8 Papers
86 Citations
Jasper Menger is an academic researcher from ASML Holding. The author has contributed to research in topics: Reticle & Matching (statistics). The author has an hindex of 4, co-authored 8 publications.
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Papers
Patent
Methods & apparatus for obtaining diagnostic information relating to an industrial process.
Alexander Ypma,Jasper Menger,David Deckers,David Han,Koopman Adrianus Cornelis Matheus,Irina Lyulina,Middlebrooks Scott Anderson,Richard Johannes Franciscus Van Haren,Jochem Sebastiaan Wildenberg +8 more
- 05 Sep 2014
TL;DR: In this paper, a multivariate analysis is performed to decompose the set of vectors representing the semiconductor wafers in a multidimensional space into one or more component vectors, and diagnostic information about the industrial process is extracted using said component vectors.
33
Tool-to-tool optical proximity effect matching
L. Van Look,Joost Bekaert,Peter De Bisschop,Jeroen Van de Kerkhove,Geert Vandenberghe,Koen Schreel,Jasper Menger,Guido Schiffelers,Edwin Wilhelmus Marie Knols,Rob Willekers +9 more
TL;DR: This paper reports on the matching strategy that was developed to perform a tool-to-tool matching and presents experimental matching results for several tool combinations at numerical apertures 0.75, 0.85 and 1.2.
25
Patent
Methods and apparatus for obtaining diagnostic information relating to an industrial process
Alexander Ypma,Jasper Menger,David Deckers,David Han,Koopman Adrianus Cornelis Matheus,Irina Lyulina,Middlebrooks Scott Anderson,Richard Johannes Franciscus Van Haren,Jochem Sebastiaan Wildenberg +8 more
- 05 Sep 2014
TL;DR: In this article, a multivariate analysis is performed to decompose a set of vectors representing the units in a multidimensional space into one or more component vectors, and diagnostic information about the industrial process is extracted using the component vectors.
18
Patent
Methods and apparatus for calculating substrate model parameters and controlling lithographic processing
Jasper Menger,Paul Cornelius Hubertus Aben,Everhardus Cornelis Mos +2 more
- 12 Nov 2015
TL;DR: In this paper, an extended high-order substrate model is defined using a combination of basis functions that include an edge basis function related to a substrate edge, for example, an exponential decay function or a rational function.
4
Experimental proximity matching of ArF scanners
Joost Bekaert,L. Van Look,P. De Bisschop,J. Van de Kerkhove,Vandenberghe G,Koen Schreel,Jasper Menger,Guido Schiffelers,Edwin Wilhelmus Marie Knols,H. van der Laan,Robert Wilhelm Willekers +10 more
- 20 Nov 2008
TL;DR: In this paper, a tool-to-tool matching strategy was developed to calculate the optimal scanner parameters for matching the two tools by determining the sensitivities to scanner parameter variations like NA, Sigma, Focus Drilling, Ellipticity and Dose from wafer data and/or simulations.
4