James Schellenberg
University of Manitoba
18 Papers
487 Citations
James Schellenberg is an academic researcher from University of Manitoba. The author has contributed to research in topics: Thin film & Microcrystalline. The author has an hindex of 8, co-authored 18 publications.
Chat about Author
Papers
Patent
Radio communication network for remote data generating stations
Dennis F. Johnson,Michael Wiebe,Erwin Holowick,Nathan R. Jacob,Michael F. Murphy,James Schellenberg,Michael S. Stasenski +6 more
- 15 Feb 1990
TL;DR: In this paper, a wide area communications network (WAN) is defined as a layered network having a hierarchical communications topology, which collects network data generated by a plurality of physical devices such as gas, water or electricity meters.
361
Patent
Apparatus for connecting digital subscriber lines to central office equipment
Tet Hin Yeap,James Schellenberg +1 more
- 30 Nov 2001
TL;DR: In this paper, a session switch is provided for making virtual connections between respective ones of the interface units whose associated DSL lines are active and the DSP modems, and the session switch maintains each connection for the duration of a session.
20
Patent
Movable integrated scanner for surgical imaging applications
David Graves,John Saunders,Gord Klimenko,Tony Lentz,Hong Yu,Jonathan Li,James Schellenberg +6 more
- 20 Jun 2007
TL;DR: In this article, the PET ring is mounted in the bore for longitudinal movement, and the quench tube for the magnet passes through the slew ring with a rotary union at the axis, where the shielding covers include a fixed upper part and a lower part which rotates about the axis with the magnet.
19
Effects of substrate bias on structure and properties of a-Si:H films deposited by ECR microwave plasmas
T. V. Herak,T.T. Chau,S. R. Mejia,P. K. Shufflebotham,James Schellenberg,Howard C. Card,K. C. Kao,Robert D. McLeod +7 more
TL;DR: The optical, electronic, and structural properties of a-Si:H films deposited by ECR microwave plasmas at 10−3 torr have been studied as functions of substrate bias.
17
Investigation of the amorphous‐to‐microcrystalline transition of hydrogenated silicon films by spectroscopic ellipsometry
TL;DR: In this article, the transition from amorphous-to-microcrystalline films is accompanied by a reduction in the material density and a significant increase in the surface roughness overlayer.
15