James Kent Howard
IBM
125 Papers
2.7K Citations
James Kent Howard is an academic researcher from IBM. The author has contributed to research in topics: Thin film & Layer (electronics). The author has an hindex of 34, co-authored 125 publications.
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Papers
Giant magnetoresistance at low fields in discontinuous NiFe-Ag multilayer thin films
TL;DR: For a wide range of NiFe and Ag thicknesses, no giant magnetoresistance was observed in the unannealed films, which may be of significant practical importance as sensors that require large changes in resistance at low fields, such as magnetoresistive heads used in magnetic recording systems.
264
Ba‐ferrite thin‐film media for high‐density longitudinal recording (invited)
T. L. Hylton,Michael Andrew Parker,Muhammad Inayet Ullah,Kevin R. Coffey,R. Umphress,James Kent Howard +5 more
TL;DR: In contrast to most recent work on Ba•ferrite thin film media, polycrystalline films with large inplane remanence for longitudinal recording are emphasized in this article, which is an attractive candidate for future high-density recording media because of its large coercivity, corrosion resistance, high hardness, and durability.
131
Patent
Method for manufacture of ultra-thin film capacitor
Arup Bhattacharyya,Wei-Kan Chu,James Kent Howard,Francis W. Wiedman +3 more
- 13 Feb 1981
TL;DR: In this article, a suitable substrate is provided to which is applied a metal electrically conductive film electrode, which is then exposed to ion beam implantation to impregnate the surface of the metal electrode with O+ or N+ ions.
118
Patent
Magnetoresistive read transducer
Robert E. Fontana,James Kent Howard,James Hsi-Tang Lee,Haralambos Lefakis +3 more
- 28 Mar 1988
TL;DR: In this paper, a magnetoresistive read transducer comprising a thin film MR layer formed of ferromagnetic material and a nonmagnetic thin film spacer layer in contact with the MR layer is presented.
114
Kinetics of compound formation in thin film couples of Al and transition metals
TL;DR: In this paper, the authors used a conductance method and nuclear backscattering for reaction-rate measurements for thin film couples of Al and transition metals such as Cr, Ti, Hf, Zr, Co, Ta, Pd, and Pt.
107