J. Szuber
Silesian University of Technology
28 Papers
211 Citations
J. Szuber is an academic researcher from Silesian University of Technology. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Thin film. The author has an hindex of 15, co-authored 28 publications.
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Papers
Photoemission study of the Si(111)-native SiO2/copper phthalocyanine (CuPc) ultra-thin film interface
TL;DR: In this article, the authors examined the interface formation between deposited copper phthalocyanine (CuPc) thin films and covered with native oxide n- and p-type silicon Si(1.1) substrates.
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XPS analysis of surface chemistry of near surface region of epiready GaAs(1 0 0) surface treated with (NH4)2Sx solution
TL;DR: In this article, the effect of NH 2 S x wet treatment on the GaAs(1.0.0) covered with an epiready oxide layer without any pretreatment in order to check the removal of oxides and carbon-related contamination was analyzed.
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AFM study of the surface morphology of L-CVD SnO2 thin films
TL;DR: In this paper, the results of atomic force microscopy (AFM) characterisation of the surface morphology of the L-CVD SnO 2 thin films were presented after exposure to air, dry air oxidation, and ion beam profiling.
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XPS study of the surface chemistry of Ag-covered L-CVD SnO2 thin films
TL;DR: In this article, the results of X-ray photoelectron spectroscopy characterization of SnO 2 thin films prepared by laser chemical vapour deposition (L-CVD) and subsequently covered by Ag atoms just after deposition and after long-term exposed to dry air, subsequent annealing in ultra high vacuum at 400°C and dry air oxidation at 400
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X-ray photoelectron spectroscopy and thermal desorption spectroscopy comparative studies of L-CVD SnO2 ultra thin films
TL;DR: In this article, the results of comparative studies of the chemical stability of L-CVD SnO 2 ultra thin films (20nm) deposited on the atomically clean Si(100) substrate after their subsequent in situ hydrogenation and oxidation, and then after air exposure.
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