The field of terahertz integrated technology has undergone significant development in the past ten years. This has included work on different substrate technologies such as III–V semiconductors and silicon, work on field-effect transistor devices and heterojunction bipolar devices, and work on both fully electronic and hybrid electronic–photonic systems. While approaches in electronic and photonics can often seem distinct, techniques have blended in the terahertz frequency range and many emerging systems can be classified as photonics-inspired or hybrid. Here, we review the development of terahertz integrated electronic and hybrid electronic–photonic systems, examining, in particular, advances that deliver important functionalities for applications in communication, sensing and imaging. Many of the advances in integrated systems have emerged, not from improvements in single devices, but rather from new architectures that are multifunctional and reconfigurable and break the trade-offs of classical approaches to electronic system design. We thus focus on these approaches to capture the diversity of techniques and methodologies in the field. This Review Article examines the development of terahertz integrated electronic and hybrid electronic–photonic systems, considering, in particular, advances that deliver important functionalities for applications in communication, sensing and imaging.

Terahertz integrated electronic and hybrid electronic–photonic systems

A 1 k-pixel camera chip for active terahertz video recording at room-temperature has been fully integrated in a 65-nm CMOS bulk process technology. The 32 × 32 pixel array consists of 1024 differential on-chip ring antennas coupled to NMOS direct detectors operated well-beyond their cutoff frequency based on the principle of distributed resistive self-mixing. It includes row and column select and integrate-and-dump circuitry capable of capturing terahertz videos up to 500 fps. The camera chip has been packaged together with a 41.7-dBi silicon lens (measured at 856 GHz) in a 5 × 5 × 3 cm3 camera module. It is designed for continuous-wave illumination (no lock-in technique required). In this video-mode the camera operates up to 500 fps. At 856 GHz it achieves a responsivity Rv of about 115 kV/W (incl. a 5-dB VGA gain) and a total noise equivalent power (NEPtotal) of about 12 nW integrated over its 500-kHz video bandwidth. At a 5-kHz chopping frequency (non-video mode) a single pixel can provide a maximum responsivity Rv of 140 kV/W (incl. a 5-dB VGA gain) and a minimum noise equivalent power ( NEP) of 100 pW/√Hz at 856 GHz. The wide-band antenna and pixel design achieves a 3-dB bandwidth of at least 790-960 GHz.

A 1 k-Pixel Video Camera for 0.7–1.1 Terahertz Imaging Applications in 65-nm CMOS

Traditional terahertz (THz) equipment faces major obstacles in providing the system cost and compactness necessary for widespread deployment of THz applications. Because of this, the field of THz integrated circuit (THz IC) design in CMOS and SiGe HBT technologies has surged in the last decade. An interplay of advances in silicon process technology, design technique, and microelectronic packaging promises to narrow the gap between the requirements and the reality of system cost and performance of THz components. Furthermore, the scalability, reconfigurability, and signal processing features of silicon technology have initiated research in complex THz ICs that expand the functionality of THz systems; this has enabled new applications, methods, and algorithms. This paper reviews the progress in THz IC research and investigates several realizations of THz imaging and sensing applications with silicon-based components regarding their motivation, system performance, and challenges. THz computed tomography, broadband multicolor imaging, high-resolution FMCW radar imaging, subwavelength resolution near-field imaging, and compressed sensing are presented.

Terahertz Imaging and Sensing Applications With Silicon-Based Technologies

Terahertz (THz)-band communications are a key enabler for future-generation wireless communication systems that promise to integrate a wide range of data-demanding applications. Recent advances in photonic, electronic, and plasmonic technologies are closing the gap in THz transceiver design. Consequently, prospect THz signal generation, modulation, and radiation methods are converging, and corresponding channel model, noise, and hardware-impairment notions are emerging. Such progress establishes a foundation for well-grounded research into THz-specific signal processing techniques for wireless communications. This tutorial overviews these techniques, emphasizing ultramassive multiple-input–multiple-output (UM-MIMO) systems and reconfigurable intelligent surfaces, vital for overcoming the distance problem at very high frequencies. We focus on the classical problems of waveform design and modulation, beamforming and precoding, index modulation, channel estimation, channel coding, and data detection. We also motivate signal processing techniques for THz sensing and localization.

An Overview of Signal Processing Techniques for Terahertz Communications

Highly scaled indium phosphide (InP) heterojunction bipolar transistor (HBT) technologies have been demonstrated with maximum frequencies of oscillation ( $f_{\max}$ ) of >1 THz and circuit operation has been extended into the lower end of the terahertz (THz) frequency band. InP HBTs offer high radio-frequency (RF) output power density, millivolt (mV) threshold uniformity, and high levels of integration. Integration with multilevel thin-film wiring permits the realization of compact and complex THz monolithic integrated circuits (TMICs). Circuit results reported from InP HBT technologies include: 200-mW power amplifiers at 210 GHz, 670-GHz amplifiers and fundamental oscillators, and fully integrated 600-GHz transmitter circuits. We review the state of the art in THz-capable InP HBT devices and integrated circuit (IC) technologies. Challenges in extending transistor bandwidth and in circuit design at THz frequencies will also be addressed.

InP HBT Technologies for THz Integrated Circuits

An experimental SiGe HBT technology featuring fT/fmax/BVCEO = 505 GHz/720 GHz/1.6 V and a minimum CML ring oscillator gate delay of 1.34 ps is presented. The improved speed compared to our previous SiGe HBT developments originates primarily from an optimized vertical profile, an additional decrease of the base and emitter resistance which is made possible by combining millisecond annealing with a low-temperature backend, and from lateral device scaling.

SiGe HBT with fx/fmax of 505 GHz/720 GHz

The operation of SiGe HBTs at cryogenic temperatures is investigated experimentally and theoretically. It is demonstrated that the collector current at cryogenic temperatures is caused by electron tunneling through the base. The temperature dependence of the transistor characteristics reveals a transition from conventional thermally activated transport at room temperature to tunneling dominated transport at cryogenic temperatures. Experimental results are presented for HBTs with a peak current gain of 8000 at 300 K and 45000 at 10 K.

Operation of sige HBTs at cryogenic temperatures

A SiGe HBT technology featuring f T /f max /BV CEO =300GHz/500GHz/1.6V and a minimum CML ring oscillator gate delay of 2.0 ps is presented. The speed-improvement compared to our previous SiGe HBT generations originates from lateral device scaling, a reduced thermal budget, and changes of the emitter and base composition, of the salicide resistance as well as of the low-doped collector formation.

SiGe HBT technology with f T /f max of 300GHz/500GHz and 2.0 ps CML gate delay

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SiGe HBT with fx/fmax of 505 GHz/720 GHz

Operation of sige HBTs at cryogenic temperatures

SiGe HBT technology with f T /f max of 300GHz/500GHz and 2.0 ps CML gate delay