4.3. Manganese Oxide-Based Compounds 1291 4.3.1. MnO2-Type Compounds 1291 4.3.2. Ternary Lithiated LixMnOy Compounds 1293 4.4. Vanadium Pentoxide V2O5 1298 4.4.1. V2O5 Structure 1298 4.4.2. LixV2O5 Bulk Phases 1300 4.4.3. LixV2O5 Crystallized Thin Films 1303 4.5. Titanium Oxide-Based Compounds 1305 4.5.1. Lithium Titanate Li4Ti5O12 1306 4.5.2. TiO2 Anatase 1308 5. Phospho-olivine LiFePO4 Compound 1312 6. General Conclusion 1314 7. Acknowledgments 1315 8. References 1315

Raman Microspectrometry Applied to the Study of Electrode Materials for Lithium Batteries

Nanostructured thin film electrodes for lithium storage and all-solid-state thin-film lithium batteries

High performance sputtered LiCoO2 thin films obtained at a moderate annealing treatment combined to a bias effect

This review article presents the literature survey on radio frequency (RF)-magnetron sputtered LiCoO2 thin films used as cathode materials in all-solid-state rechargeable lithium microbatteries. As the process parameters lead to a variety of texture and preferential orientation, the influence of the sputtering conditions on the deposition of LiCoO2 thin films are considered. The electrochemical performance is examined as a function of composition of the sputter Ar/O2 gas mixture, gas flow rate, pressure, nature of substrate, substrate temperature, deposition rate, and annealing temperature. The state-of-the-art of lithium microbatteries fabricated by the rf-sputtering method is also reported.

Sputtered LiCoO2 Cathode Materials for All-solid-state Thin-film Lithium Microbatteries.

As-deposited LiCoO2 thin film cathodes prepared by rf magnetron sputtering

The RF plasma jet system was investigated as a source for the sputtered deposition of LiCoOx thin films. As preliminary results of experiments, LiCoOx films with hexagonal high temperature structure were deposited. The RF hollow cathode in the shape of the cylindrical nozzle was sintered from powder of LiCoO2. This hollow cathode was reactively sputtered in Ar+O2. Plasma jet parameters were investigated during the sputtering process by a Langmuir probe system in the position of the substrate. The electron energy distribution function (EEDF) deviated from the Maxwellian distribution mainly in the energetic range below 5 eV. For higher energies above this value, the EEDF could be approximated with a Maxwellian fit in the limited interval of energies. Obtained electron concentrations were in the range ne=109–6×1010 cm−3 and were strongly dependent on the magnitude of the applied RF power PRF. Electron temperature Teh describing only the limited energy part of EEDF was calculated from this Maxwellian fit and the dependence of Teh on PRF is discussed. Besides XRD, deposited films were investigated by electron microprobe system, scanning electron microscopy and cyclic voltammetry.

Investigation of the RF plasma jet system for deposition of LiCoOx thin films

LiCoO2 thin-film cathodes grown by RF sputtering

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Investigation of the RF plasma jet system for deposition of LiCoOx thin films

LiCoO2 thin-film cathodes grown by RF sputtering