Hans Biebuyck

Abstract: scope was reached by ion beam milling the disks until perforation. A Philips CM30 TEMISTEM, operating at 300 kV, was used for the structural investigation. A custom-built instrument was used for SIMS analysis. A monochromatic (1-10 keV) 0; ion beam collimated to 50 pm was generated in a mass-Ciltered duoplasmatron ion gun (model DPSOB, VG Fisons). The secondary ion optics were of three-lens design with a central stop interfaced with a Balzers QMA 400 quadrupole mass analyzer (mass range 2048 u). A secondary electron multiplier (90’ off-axis) was used for positiveand negative-ion detection in the counting mode. Lens potentials, quadrupole electronic control units and the detection system were controlled by a Balzers QMG 421 unit. The control of the instrument and the collection of data were carried out by two personal computers connected to a local area network (Windows for Workgroups, Version 95). Sputtering of the Ag-doped silica coatings was carried out with a 2 keV Oy primary ion energy at an ion current of 400800 nA. During the experiments the vacuum chamber was kept at 5 x 10‘ Pa.

TL;DR: In this article, a review demonstrates that STM effectively tests new types of control over the microscopic structure of self-assembled monolayers on gold that should prove useful to their application.

TL;DR: This study uses lithography based on scanning tunneling microscopy (STM) to demonstrate that disruption of SAMs on gold allowed the formation of etched features as small as 20 nm using a CN - /O 2 etch, implying that etching occurred where damage of a few molecules in the ordered SAM allowed passage of cyanide, whereas adjacent molecules inthe SAM remained unperturbed at this scale.

TL;DR: Light-coupling masks (LCM) as mentioned in this paper allow pattern replication at high resolution and densities over large areas in photoresist without the need for elaborate projection optics, where the light is differentially guided by the structures towards the substrate.