Hamid Dadvar
University of Gilan
2 Papers
25 Citations
Hamid Dadvar is an academic researcher from University of Gilan. The author has contributed to research in topics: Thin film & Titanium dioxide. The author has an hindex of 1, co-authored 2 publications.
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Papers
UV-protection and photocatalytic properties of electrospun polyacrylonitrile nanofibrous mats coated with TiO2 nanofilm via sol–gel
TL;DR: In this paper, the authors described the UV protection and photocatalytic properties of TiO2 nanofilm coated electrospun polyacrylonitrile (PAN) nanofibrous mats.
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Synthesis, Properties, and Applications of Special Substrates Coated by Titanium Dioxide Nanostructured Thin Films via Sol-Gel Process
Hamid Dadvar,Farhad E. Ghodsi,Saeed Dadvar +2 more
- 01 Jan 2012
Abstract: In this chapter, the sol-gel made titanium dioxide nanostructured thin films deposited on special substrates such as glasses, mica, steels, textiles, fibers, and other organic/inorganic substrates were reviewed. Through this review, several distinctive properties such as optical, electrical, photocatalytic, morphological, and mechanical properties of TiO2 nanostructured thin films were described. Also, a wide range of practical application of TiO2 nanostructured thin films such as dye-sensitised solar cells, optical coatings, humidity and gas sensors, selfcleaning, dielectric, and antibacterial surfaces were discussed in details. Dip and spin coating techniques were demonstrated as suitable methods for deposition of thin films. It has been shown that properties of such films can be affected by type of coating technique, stabilizer, precursor material, solvents, pH and viscosity of precursor solution, aging, and etc. Finally, Successive Interference Fringes Method (SIFM) was presented as a simple method for the determination of optical constants and thickness of TiO2 thin films from single transmission measurements. Hamid Dadvar University of Guilan, Iran Farhad E. Ghodsi University of Guilan, Iran Saeed Dadvar Isfahan University of Technology, Iran DOI: 10.4018/978-1-4666-5125-8.ch009
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