A review of particle-solid processes pertinent to modelling plasma-wall interactions is presented, and sets of recommended data are given. Analytic formulas are used where possible; otherwise, data are presented in the form of tables and graphs. The incident particles considered are e−, H, D, T, He, C, O, and selfions. The materials include the metals aluminum, beryllium, copper, molybdenum, stainless steel, titanium, and tungsten and the nonmetals carbon and TiC. The processes covered are light ion reflection, hydrogen and helium trapping and detrapping, desorption, evaporation, sputtering, chemical effects in sputtering, blistering caused by implantation of helium and hydrogen, secondary electron emission by electrons and particles, and arcing.

Data Compendium for Plasma-Surface Interactions

Energy and angular distributions of sputtered particles

The particles sputtered from a solid surface during particle bombardment are mostly neutral atoms emitted with an angular distribution that can be more peaked or broader than a cosine distribution. For single crystals, emission peaks are found in close-packed crystal directions. These emission distributions are influenced by the surface topography that develops during sputtering, by correlated collision sequences in the spread of the collision cascade in single crystals, and by the last collisions close to the surface where the atoms are sputtered. The sputtered atoms have a broad energy distribution that peaks at a few eV, about half the surface binding energy. A small fraction of the sputtered particles are clusters containing up to 15 atoms or more. For spike conditions a fraction of the sputtered atoms have thermal (a few thousand kelvin) energies, but also larger clusters containing up to some 1000 atoms are released. On rough, partly oxidized surfaces emission of microparticles (chunks) with up to 1012 atoms was found.

Angular, energy, and mass distribution of sputtered particles

Bombardment of surfaces by ions gives rise to a variety of inelastic collision events leading to the ejection of excited atoms and ions. Such excited sputtered particles have been studied since more than 80 years through their optical emission, when they decay in front of the target to the electronic ground state, having lifetimes of 10−9 to 10−7 s, typically. Information on the energy distribution of such excited states can be obtained by two different techniques: light vs distance measurements (LvD) and by studying line profile broadening in light emission due to the Doppler effect. Only recently it has become possible to study in addition metastable excited atoms using laser induced fluorescence spectroscopy (LIF). Relative sputtering yields and energy distributions have been measured for such metastable states and two types can be distinguished. States with a very low excitation energy (0–0.3 eV), being sublevels of the electronic ground state, were found to have yields and energy distributions comparable to the electronic ground state, while metastable states at higher excitation energies (above 1 eV) seem to behave similar to short lived excited states, typically observed in secondary photon emission (BLE) with excitation energies in the range of 2–6 eV. This behaviour is also clearly visible with respect to oxygen surface coverage or increased near surface oxygen concentration where, similar to secondary ion emission, drastic changes in the yield by orders of magnitude have been found for excited atoms as well as for ions. In addition, under the same conditions a strong decrease in the sputtering yield of neutral ground state atoms has been observed for a number of metals. LIF results for highly excited metastable states are compared with recent results obtained by studying line profile broadening in light emission for Ca, Al and Cr targets. Different mechanisms that have been proposed to account for the observations will be discussed.

Electronic excitation in sputtered atoms and the oxygen effect

(14G) Narasaki, H. Anal. Chim. Acta 1981, 725, 187. (150) Oda, C. E.; Ingle, J. D. Anal. Chem. 1981, 53, 2030. (16G) Oda, C. E.; Ingle, J. D. Anal. Chem. 1981, 53, 2305. (17G) Oster, 0. J. Clin. Chem. Clin. Biochem. 1981, 79, 471. (18G) Pollock, E. W. At. Spectrosc. 1980, 7, 78. (19G) Randiesome, J. E.; Aston, S. R. Environ. Techno/. Lett. 1980, I , 3. (20G) Sanemasa, I.; Takagui, E.; Deguchi, T.; Nagai, H. Anal. Chim. Acta

Surface analysis: x-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary ion mass spectrometry

Surface normal velocity distribution of sputtered Zr-atoms for light-ion irradiation

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Surface normal velocity distribution of sputtered Zr-atoms for light-ion irradiation