H. Chandra
4 Papers
39 Citations
H. Chandra is an academic researcher. The author has contributed to research in topics: Thin film & Plasma-enhanced chemical vapor deposition. The author has an hindex of 3, co-authored 4 publications.
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Papers
Silicon nitride ARC thin films by new plasma enhanced chemical vapor deposition source technology
M. George,H. Chandra,P. Morse,J. Morris,John Madocks +4 more
- 11 May 2008
TL;DR: In this paper, the results of the process development for hydrogenated silicon nitride thin films are discussed, including bond densities, refractive index, extinction coefficients and hydrogen concentration of deposited films.
31
Latest innovations in large area web coating technology via plasma enhanced chemical vapor deposition source technology
TL;DR: In this article, the authors discuss the latest results of their development of large area plasma enhanced chemical vapor deposition (PECVD) source technologies for flexible substrates, which provide an economical alternative to low temperature sputtering technologies and enable some thin film materials not accessible by sputtering.
8
Silicon Nitride ARC Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology
John Madocks,J. Morris,P. Morse,H. Chandra,M. George +4 more
- 01 Nov 2008
TL;DR: In this article, the results of the process development for hydrogenated silicon nitride thin films are discussed, including bond densities, refractive index, extinction coefficients and hydrogen concentration of deposited films.
3