H Baumgärtner
Bundeswehr University Munich
12 Papers
161 Citations
H Baumgärtner is an academic researcher from Bundeswehr University Munich. The author has contributed to research in topics: Dangling bond & Surface reconstruction. The author has an hindex of 7, co-authored 12 publications.
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Papers
Current-Time Behavior of Smooth and Porous PtRu Surfaces for Methanol Oxidation
TL;DR: In this article, the authors show that smooth ultrahigh vacuum-cleaned PtRu alloys, used as model catalysts for methanol oxidation, present a continuous loss of activity under potentiostatic conditions.
114
STM studies of C60 on a Si(1 1 1):B surface phase
TL;DR: In this paper, the growth of fullerene C 60 on Si(1 1 1/1/1) surfaces was investigated and the first layer of C 60 passivates the 7×7 reconstructed surface and enables closely packed reconstructions to be formed on these fulleren islands.
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In-situ STM studies of the self-assembling formation of boron surface phases on Si(111)
TL;DR: In this article, the formation of the surface phase during evaporation of boron onto a Si 7 X 7 surface under ultra-high vacuum conditions by in-situ STM was investigated.
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The formation of silicon (111) boron surface phases and their influence on the epitaxial growth of silicon and germanium
Joerg Schulze,H Baumgärtner,C Fink,G. Dollinger,I Gentchev,L Görgens,Walter Hansch,Harry E. Hoster,T. H. Metzger,R. Paniago,T Stimpel,T. Sulima,Ignaz Eisele +12 more
TL;DR: In this article, it was shown that the deposition of B with concentrations up to 2.6 × 10 14 cm -2 leads to a breakdown of the 7 × 7 reconstructed Si surface of the buffer layer and the formation of a Si( 11 1)-√3 × √3R30°B surface phase (BSP) located on T 4 -sites.
12
Dopant diffusion during rapid thermal oxidation
Andreas Stadler,T. Sulima,Joerg Schulze,C Fink,Anil Kottantharayil,Walter Hansch,H Baumgärtner,Ignaz Eisele,W Lerch +8 more
TL;DR: In this paper, the dopant diffusion behavior during rapid thermal oxidation (RTO) is investigated, in particular the oxidation enhanced diffusion (OED) for diffusion monitoring, samples were fabricated by means of molecular beam epitaxy (MBE) to create sharp doping profiles with nanometer resolution.
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