Graham T. Reed
University of Southampton
496 Papers
2.7K Citations
Graham T. Reed is an academic researcher from University of Southampton. The author has contributed to research in topics: Silicon photonics & Photonics. The author has an hindex of 46, co-authored 479 publications. Previous affiliations of Graham T. Reed include University of Surrey & Shanghai Jiao Tong University.
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Papers
A Si Optical Modulator Based on Fano-Like Resonance
Han Du,Weiwei Zhang,Wei Cao,David J. Thomson,Callum G. Littlejohns,Xingzhao Yan,D. T. Tran,Mehdi Banakar,Graham T. Reed +8 more
TL;DR: In this article, the authors presented an experimental demonstration of a Si optical modulator based on Fano-like resonance, which is the first of its kind in the literature and obtained 20 Gb/s data rate on-off keying.
Suspended mid-infrared waveguides for Stimulated Brillouin Scattering.
Mikolaj K. Schmidt,Christopher G. Poulton,Goran Z. Mashanovich,Graham T. Reed,Benjamin J. Eggleton,Michael J. Steel +5 more
TL;DR: A theoretical formalism is derived that can be used to compute the opto-acoustic interaction in such periodic structures, and forward intramodal-SBS gains up to 1750 m-1W-1 are found, which compares favorably with the proposed MIR SBS designs based on buried germanium waveguides.
β-SiC-on insulator waveguide structures for modulators and sensor systems
TL;DR: In this article, the waveguide structures using the cubic polytype of SiC are analyzed and a detailed analysis and interpretation of the different loss mechanisms is presented, where two different waveguides were fabricated by two different methods.
A sub-micron depletion-type photonic modulator in Silicon On Insulator.
TL;DR: Detailed analysis of a four terminal p+pnn+ optical modulator integrated into a silicon-on-insulator (SOI) rib waveguide to approach birefringence free operation is provided.
Trimming of ring resonators via ion implantation in silicon
TL;DR: In this article, the authors discuss the design, modelling and fabrication of ring resonators and their subsequent trimming using ion implantation of Germanium into silicon followed by annealing, which can form the basis of a refractive index change in optical devices.