Characterization of carbon nitride thin films deposited by a combined RF and DC plasma beam

A plasma torch aiming to assist the detritiation process of Tokamak tiles in gaps and zones with difficult access, like in the divertor regions, was designed and built up. The torch operation is based on the expansion of a radiofrequency discharge constrained to burn in a limited space. The plasma torch is small size, flexible and compatible with mounting on a robotic arm, and can be operated stable both in argon and nitrogen at low and atmospheric pressure. The capability of the source in cleaning surfaces was proved by experiments on material removal from graphite and CFC tiles.

Flexible small size radiofrequency plasma torch for Tokamak wall cleaning

A double-chamber capacitively coupled RF discharge for plasma assisting deposition techniques

Plasma expansion from a hot and dense source, where electric or electromagnetic energy is dissipated, to a low pressure environment, is a very general physical phenomenon which concerns a large variety of objects and covers a broad range of dimensions. The physical issues addressed are relevant to many subjects in science ranging from astrophysical objects [1,2], like supernovae and solar flares, to small laser spots [3-7] and cathode spots [8] (as in vacuum arc). On intermediate scale, it also includes expansion from thermal plasma sources (DC, RF, microwave torches) for plasma chemistry [9-11], as well as divertor region of Tokamak plasmas [12]. Applications of high density plasmas are laser plasma cutting, welding, heating, and annealing [9], and the generation of VUV and X-ray radiation [13]. For the latter two applications, a high temperature, multiple ionization, and high (laser) power densities are required. Laser produced plasmas are also projected to create modulated plasmas for plasma based free electron lasers. Finally in (vacuum) arc switching, the conductive properties of high density plasmas are used

The Physics of Plasma Expansion

Carbon nitride thin films have been downstream deposited from a nitrogen plasma beam sustained by a capacitively coupled discharge generated between a RF powered carbon electrode and a grounded carbon nozzle. The spectral emission of the plasma jet strongly exhibits the CN radical emission indicating that the deposition takes place via a mechanism involving the CN radical. The deposition process is enhanced by DC biasing the powered electrode. The films have been investigated by X-ray diffraction, infrared absorption spectroscopy and X-ray photoelectron spectroscopy. The results show that the films are amorphous and contain in a large extent carbon nitrogen bonds.

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Carbon nitride thin films prepared by a capacitively coupled RF plasma jet

A method for obtaining a medium pressure (p ∼ 1 torr), low power (< 100 W), RF-generated plasma jet, suitable for chemical kinetics studies and technological applications is described. Though various supply gases can be used to create the plasma jet, only results on the properties of a nitrogen jet are given in this paper with an emphasis on some spectral and electrical characteristics. The emission spectra of the nitrogen jet are discussed and spatial distributions of the relative concentration of nitrogen or radical impurities emitting species such as N2(C3Πu, v' = 0), NH(A3Πg, v'=0) in the bulk of the postdischarge plasma are calculated from the intensity of their vibrational bands. Electrical space resolved double probe measurements and the spatial distributions of the electron density and temperature in the plasma jet are also presented. Possible applications are shortly discussed.

Spectral and Electrical Properties of a Medium Pressure, Low‐Power, RF‐Generated Postdischarge Nitrogen Plasma Jet

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Spectral and Electrical Properties of a Medium Pressure, Low‐Power, RF‐Generated Postdischarge Nitrogen Plasma Jet