4 Papers
34 Citations
G. Capote is an academic researcher from Pontifical Catholic University of Rio de Janeiro. The author has contributed to research in topics: Plasma-enhanced chemical vapor deposition & Thin film. The author has an hindex of 4, co-authored 4 publications.
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Papers
Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstructure
TL;DR: Amorphous hydrogenated carbon films (a-C:H) were deposited by rf-PECVD using 13 Pa methane (98%)-argon (2%) mixture or pure methane as precursor atmospheres as discussed by the authors.
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Amorphous hydrogenated carbon films deposited by PECVD in methane atmospheres highly diluted in argon: effect of the substrate temperature
TL;DR: Amorphous hydrogenated carbon films (a-C:H) were deposited by r.f.-PECVD using 13 Pa methane (98%)-argon (2%) mixture or pure methane as precursor atmospheres as mentioned in this paper.
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Nanoporosity in plasma deposited amorphous carbon films investigated by small-angle X-ray scattering
TL;DR: In this article, a small-angle X-ray scattering (SAXS) analysis of carbon films was performed using the GNOM code assuming a distribution of spherical pores, and the analysis suggested that the maximum pore size distribution occurs for a radius value below 1 nm.
Plasma deposition of amorphous carbon films from CH4 atmospheres highly diluted in Ar
TL;DR: In this paper, the deposition, structure and mechanical properties of hydrogenated amorphous carbon films grown in highly Ar-diluted CH4 atmospheres were investigated for a total pressure of 13 Pa.