F. Lechtenberg
University of Hamburg
7 Papers
66 Citations
F. Lechtenberg is an academic researcher from University of Hamburg. The author has contributed to research in topics: Synchrotron radiation & Synchrotron. The author has an hindex of 5, co-authored 7 publications.
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Papers
Excitation of Kossel patterns by synchrotron radiation
Hans-Jürgen Ullrich,Matthias Schlaubitz,F. Friedel,T. Spann,Jürgen Bauch,T. Wroblewski,S. Garbe,G. Gaul,Arndt Knöchel,F. Lechtenberg,Elisabeth Rossmanith,G. Kumpat,G. Ulrich +12 more
TL;DR: In this paper, the first demonstration that Kossel patterns can be observed using fluorescent radiation excited by synchrotron X-rays is presented, and the first test experiment for Cu and GaAs single crystals were investigated.
25
Corrosion phenomena in electron, proton and synchrotron X-ray microprobe analysis of Roman glass from Qumran, Jordan
Koen Janssens,A. Aerts,Laszlo Vincze,Freddy Adams,Changyi Yang,R.J. Utui,Klas Malmqvist,Keith W. Jones,Martin Radtke,S. Garbe,F. Lechtenberg,Arndt Knöchel,Hilde Wouters +12 more
TL;DR: In this article, a series of 89 glass fragments of Roman glass were studied using electron, proton and synchrotron radiation induced X-ray emission from microscopic areas on the sample surface.
23
Total reflection X-ray fluorescence analysis with synchrotron radiation monochromatized by multilayer structures
R. Rieder,P. Wobrauschek,W. Ladisich,Christina Streli,Hannes Aiginger,S. Garbe,G. Gaul,Arndt Knöchel,F. Lechtenberg +8 more
TL;DR: In this article, a multilayer structure was proposed to obtain a relative broad energy band compared to Bragg single crystals for an efficient excitation in total reflection X-ray fluorescence analysis (TXRF) synchrotron radiation.
22
Application of a synchrotron microprobe to the analytical characterization of ion-implanted material
A. von Bohlen,Reinhold Klockenkämper,S. Garbe,G. Gaul,Arndt Knöchel,F. Lechtenberg,L. Palmetshofer +6 more
TL;DR: In this paper, a synchrotron microprobe was used to characterize ion implantations of nickel and cobalt in silicon wafers and the sharpness of the borders was characterized at a lateral resolution of 13 μm and the edge lengths ranging from 0.6 to 8 mm.
5
Patent
Mfg. glass capillaries for focussing X=rays
Arndt Knöchel,Gerhard Gaul,F. Lechtenberg +2 more
- 28 Mar 1996
TL;DR: In this paper, a process for manufacturing glass capillaries which involves heating and drawing a glass tube is described. But the main focus of this paper is to design a process in such a way that the optimal focusing characteristics are produced, which is achieved by collapsing the glass tube at two adjacent sites and heating the total area of the tube containing the two collapsed regions.
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