13 Papers
37 Citations
F. Castillo is an academic researcher from Monterrey Institute of Technology and Higher Education. The author has contributed to research in topics: Diffusion (business) & Nitriding. The author has an hindex of 5, co-authored 12 publications.
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Papers
Non parabolic interface motion for the 1-D Stefan problem: Dirichlet boundary conditions
TL;DR: In this paper, the authors studied the interface behavior over a finite domain with homogeneous Dirichlet boundary conditions for large time intervals, where the interface motion is not parabolic due to finite size effects.
An approach for the identification of diffusion coefficients in the quasi-steady state of a post-discharge nitriding process
TL;DR: This work presents a model for the nitrogen concentration in iron nitride layers at the quasi-steady state and a method for computing the diffusion coefficients for post-discharge nitriding, based upon an inverse problem of coefficient identification.
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Mathematical simulation of the layer growth kinetics during post-discharge nitriding: From early stage to quasi-steady stage
TL;DR: In this article, a mathematical model has been developed in order to describe the kinetics of the compound layer formation during a post-discharge nitriding process and an analytical approximate solution of Goodman's type is sought and representations of the motion of the interfaces and nitrogen concentration profiles are analyzed.
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A simple method for stable identification of diffusion coefficients in the quasi-steady state of a post-discharge nitriding process
TL;DR: In this article, a method for computing the diffusion coefficients during post-discharge nitriding through an inverse problem of coefficient identification in a model of the quasi-steady state is presented.
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Analysis of the growth of concomitant nitride layers produced by a post-discharge assisted process
TL;DR: In this article, the growth of concomitant nitride layers during a post-discharge process is studied, taking into account the similarities and differences between nitriding postdischarge processes and other nitride processes, employing a mathematical simulation of nitrogen diffusion.
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