Er-Xuan Ping
Micron Technology
27 Papers
725 Citations
Er-Xuan Ping is an academic researcher from Micron Technology. The author has contributed to research in topics: Layer (electronics) & Capacitor. The author has an hindex of 14, co-authored 27 publications.
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Papers
Patent
Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
Lingyi A. Zheng,Trung T. Doan,Lyle D. Breiner,Er-Xuan Ping,Kevin L. Beaman,Ronald A. Weimer,David J. Kubista,Cem Basceri +7 more
- 28 Aug 2003
TL;DR: In this paper, the authors present several systems and methods for batch processing of micro-feature workpieces, e.g., semiconductor wafers or the like, such that a first gas flow may be directed by the outlets to flow into at least one of the process spaces between adjacent workpieces along a first vector that is transverse to the direction in which the workpieces are spaced.
156
Patent
Atomic layer deposition of capacitor dielectric
Lingyi A. Zheng,Er-Xuan Ping,Lyle D. Breiner,Trung T. Doan +3 more
- 27 Nov 2001
TL;DR: In this article, a capacitor structure is formed over a semiconductor substrate by atomic layer deposition to achieve uniform thickness in memory cell dielectric layers, particularly where the dielectrics layer is formed in a container-type capacitor structure.
122
Patent
Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
Lingyi A. Zheng,Trung T. Doan,Lyle D. Breiner,Er-Xuan Ping,Ronald A. Weimer,David J. Kubista,Kevin L. Beaman,Cem Basceri +7 more
- 21 Aug 2003
TL;DR: In this paper, the authors describe an apparatus and methods for processing micro-feature workpieces, e.g., by depositing material on a microelectronic semiconductor using atomic layer deposition.
112
Patent
Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
David J. Kubista,Trung T. Doan,Lyle D. Breiner,Ronald A. Weimer,Kevin L. Beaman,Er-Xuan Ping,Lingyi A. Zheng,Cem Basceri +7 more
- 15 Oct 2003
TL;DR: In this article, a system for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers is described. Butler et al. describe a system that includes a gas phase reaction chamber, a first exhaust line coupled to the reaction chamber and first and second traps each in fluid communication with the exhaust line.
39
Patent
Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
Kevin L. Beaman,Ronald A. Weimer,Lyle D. Breiner,Er-Xuan Ping,Trung T. Doan,Cem Basceri,David J. Kubista,Lingyi A. Zheng +7 more
- 21 Aug 2003
TL;DR: In this article, the authors present methods and apparatus that may be used to process micro-feature workpieces, e.g., semiconductor wafers, in a batch process.
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