6 Papers
19 Citations
Deen Gu is an academic researcher from University of Electronic Science and Technology of China. The author has contributed to research in topics: Thin film & Sputter deposition. The author has an hindex of 2, co-authored 6 publications.
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Papers
Detection of terahertz radiation from 2.52 THz CO2 laser using a 320 × 240 vanadium oxide microbolometer focal plane array
TL;DR: In this article, a nanostructured titanium (Ti) thin film absorber is integrated in the micro-bridge structure of the VOx micro-bolometer by a combined process of magnetron sputtering and reactive ion etching.
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Design and fabrication of micro-bolometer array with double layers structure
Jun Wang,Jun Gou,Weizhi Li,Deen Gu,Yadong Jiang +4 more
- 21 Dec 2013
TL;DR: In this article, double layer micro-bolometer was designed in this paper with bottom sensitive/ top absorber structure, and the deformation and residual stress characters of single layer and double layer structure models were simulated and optimized, and with the optimized results, double-layer structure was fabricated with multifarious semiconductor recipes.
3
Study on Optical Properties of Nanostructured NiCr Film Prepared by Magnetron Sputtering and RIE for Terahertz Applications
TL;DR: In this paper, a combined process of magnetron sputtering and reactive ion etching (RIE) is suggested to obtain nanostructured NiCr film with different thicknesses by precise control of process parameters and etch time.
1
Modeling the reactive sputter deposition of Ti-doped VO x thin films
TL;DR: In this article, an original numerical model, based on the standard Berg model, is used to simulate the growth mechanism of Ti-doped VOx deposited with changing oxygen flow during reactive sputtering deposition.
1
Preparation of nanostructured NiCr film as a terahertz absorption layer by magnetron sputtering and RIE
Jun Gou,Jun Wang,Xing Zheng,Deen Gu,Yadong Jiang +4 more
- 12 Nov 2015
TL;DR: In this article, a NiCr thin film was prepared by a combination of magnetron sputtering and reactive ion etching (RIE) in 80 × 60 uncooled infrared focal plane arrays (IRFPA).
1