David N. Reinhoudt
MESA+ Institute for Nanotechnology
1082 Papers
20.9K Citations
David N. Reinhoudt is an academic researcher from MESA+ Institute for Nanotechnology. The author has contributed to research in topics: Chemistry & Membrane. The author has an hindex of 107, co-authored 1082 publications. Previous affiliations of David N. Reinhoudt include University of Modena and Reggio Emilia & University of Mainz.
Chat about Author
Papers
A general method for the determination of the kinetic stability of macrocyclic alkali-metal complexes with rates of decomplexation below 10–3 s–1
Wouter I. Iwema Bakker,M Haas,Herman J. den Hertog,Willem Verboom,Dick de Zeeuw,David N. Reinhoudt +5 more
TL;DR: In this paper, a general method has been developed for the determination of kinetic stabilities of macrocyclic alkali-metal complexes with rates of decomplexation (Kd) below 10−3 s−1, by use of radioactive isotopes.
Diazatriphenylene complexes of Eu3+ and Tb3+; promising light-converting systems with high luminescence quantum yields
TL;DR: Diazatriphenylene (1) displays the unique property that it sensitizes the long-lived luminescence of both Tb3+ and Eu3+ with high efficiency (quantum yields of 0.55 and 0.41, respectively) while allowing near UV excitation as mentioned in this paper.
5
Novel Upper Rim Functionalizations of Calix[4]arenes using the Tscherniac‐Einhorn Amidomethylation Reaction
TL;DR: In this article, a variety of upper rim functionalized calix [4]arenes have been synthesized, using the Tscherniac-Einhorn amidomethylation reaction.
5
Oxidized gold as an ultrathin etch resist applied in microcontact printing.
Ruben B.A. Sharpe,Dirk Burdinski,Jurriaan Huskens,Harold J.W. Zandvliet,David N. Reinhoudt,Bene Poelsema +5 more
TL;DR: In this paper, a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its resistive properties based upon electrostatic repulsion, which can be used as a temporary etch barrier that introduces no contaminating species.
5
•Journal Article
Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing
Ruben B.A. Sharpe,Dirk Burdinski,Jurriaan Huskens,Harold J.W. Zandvliet,David N. Reinhoudt,Bene Poelsema +5 more
TL;DR: It is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion, in a scheme that is compatible with microcontact printing.
5