A system for the measurement, analysis, removal, addition or imaging of material uses nanostructures in conjunction with mechanical, electromagnetic (optical) and electrical means. Such nanostructures and techniques are combined in a system that can modify bulk or large area objects such as silicone waffers and masks for lithography. An SPM system (100) for making modifications to an object (102) comprises an SPM probe for making the modifications to the object, a positioning system (103) for positioning the SPM probe with respect to the object, and a controller for controlling the positioning system such that the modifications of the object are made with the SPM probe particulate matter is removed from the object by the modifications, and the SPM probe makes sweeping motions over the object to sweep away the removed particulate material.g these elements in a system which can modify bulk or large area objects such as silicon wafers, and masks for lithography.

Object inspection and/or modification system and method

A data storage system that includes a positioning system for positioning the write/read mechanism and the storage medium of the data storage device with respect to each other in first and second predefined directions. The positioning system comprises a positioning apparatus comprising microfabricated first and second positioning assemblies. The positioning system further comprises a controller to position a positionable support structure of the first positioning assembly in a first predefined direction within a range of positioning that is larger than the range of movement of a moveable support structure of the first positioning assembly by controlling (A) a stationary support structure clamp in clamping and unclamping the positionable structure to and from the support structure, (B) a moveable structure clamp in clamping and unclamping the positionable support structure to and from the moveable support structure, and (C) the movement of the moveable support structure. In one embodiment, one of the write/read mechanism and the storage medium is carried by the positionable support structure so that it is positioned with the first positioning assembly. The other one of the write/read mechanism and the storage medium is positioned with the second positioning assembly. In another embodiment, the positionable support structure carries the second positioning assembly and one of the write/read mechanism and the storage medium is positioned with the second positioning assembly while the other is held stationary. In several embodiments, the read/write mechanism is used to mechanically write data to and electrically read data from the storage medium. In still another embodiment, the read/write mechanism is used to optically write data to and electrically read data from the storage medium. In yet another embodiment, the read/write mechanism is acoustically aided in electrically writing data to and reading data from the storage medium.

Nanometer scale data storage device and associated positioning system

Methods and systems for creating a numerical pseudocore model, comprising: a) obtaining logging data from a reservoir having depth-defined intervals of the reservoir, and processing the logging data into interpretable borehole image data having unidentified borehole image data; b) examining one of the interpretable borehole image data, other processed logging data or both to generate the unidentified borehole image data, processing the generated unidentified borehole image data into the interpretable borehole image data to generate warped fullbore image data; c) collecting one of a core from the reservoir, the logging data or both and generating a digital core data from one of the collected core, the logging data or both such that generated digital core data represents features of one or more depth-defined interval of the reservoir; and d) processing generated digital core data, interpretable borehole image data or the logging data to generate realizations of the numerical pseudocore model.

Method to generate numerical pseudocores using borehole images, digital rock samples, and multi-point statistics

A scanning probe microscopy (SPM) inspection and/or modification system which uses SPM technology and techniques. The system includes various types of microstructured SPM probes for inspection and/or modification of the object. The components of the SPM system include microstructured calibration structures. A probe may be defective because of wear or because of fabrication errors. Various types of reference measurements of the calibration structure are made with the probe or vice versa to calibrate it. The components of the SPM system further include one or more tip machining structures. At these structures, material of the tips of the SPM probes may be machined by abrasively lapping and chemically lapping the material of the tip with the tip machining structures.

Scanning probe microscopy inspection and modification system

In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.

Scanning probe microscope

A scanned-stylus atomic force microscope (AFM) employing the optical lever technique, and method of operating the same. The AFM of the invention includes a light source and a scanned optical assembly which guides a light beam emitted from the laser source onto a point on said cantilever during scanning thereof. A moving laser beam is thus created which will automatically track the movement of the cantilever during scanning. The invention also allows the laser beam to be used to measure, calibrate or correct the motion of the scanning mechanism, and further allows viewing of the sample and cantilever using an optical microscope.

Scanning stylus atomic force microscope with cantilever tracking and optical access

A scanning probe microscope and method having automated exchange and precise alignment of probe, wherein one or more additional stored probes (4) for installation onto a probe mount (32) are stored in a storage cassette (22) or a wafer, a selected probe is aligned to a detection system (11), and the aligned probe is then clamped against the probe mount. Clamping is performed using a clamp (68) which is disabled when removing a replacement probe from the storage cassette, enabled when installing the probe on the probe mount and disabled when releasing the probe at a later time for subsequent probe exchange. Probe alignment is automated using signal from the probe detection system or by determining probe positioning using pattern recognition processing of the probe image to allow probe removal and exchange without operator intervention. Techniques for error checking are employed to ensure proper probe installation and operation.

A scanning probe microscope having automatic probe exchange and alignment

A method of tuning or trimming a flexure stage to substantially constrain a workpiece carried by the flexure stage's free end from moving along an axis of motion that does not contain a desired path of free end travel. In the case of an XY flexure stage, measures are incorporated into the flexure stage to prevent simple out-of-plane motion (either linear or non-linear), rolling, pitching, or combinations of all three, as well as out-of-axis motion where desired. A preferred tuning technique begins with initially aligning the flexure stage's actuator so that its highest off-axis force component extends as much as possible within the plane of desired motion, followed by positioning the actuator on the flexure stage so as to eliminate as much as possible simple out-of-plane motion and accompanied if necessary by incorporating additional measures to eliminate as much as possible roll or pitch motion and residual simple out-of-plane motion. These additional measures may include attaching a wire guide structure to the flexure stage, removing materials from one or more piezo end flexures, adding materials to or removing materials from one or more flexure points or other locations of the flexure frame, and/or adding a second actuator that imposes net out-of-plane forces on the flexure frame free end that at least partially offset those imposed by the first actuator. The resulting tuned flexure stage exhibits substantially less out-of-plane and out-of-axis motion throughout the operational range of its actuator.

Method and apparatus for improving a flexure stage

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Scanning stylus atomic force microscope with cantilever tracking and optical access

A scanning probe microscope having automatic probe exchange and alignment

Method and apparatus for improving a flexure stage