Darin Bivens
Applied Materials
19 Papers
415 Citations
Darin Bivens is an academic researcher from Applied Materials. The author has contributed to research in topics: Photomask & Plasma etching. The author has an hindex of 8, co-authored 19 publications.
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Papers
Patent
Method and apparatus for photomask plasma etching
Ashok Kumar,Madhavi R. Chandrachood,Richard Lewington,Darin Bivens,Amitabh Sabharwal,Sheeba J. Panayil,Alan Ouye +6 more
- 30 Oct 2006
TL;DR: In this article, a method and apparatus for etching photomasks is described, which comprises a process chamber having a support pedestal adapted for receiving a photomask, an ion neutral shield is disposed above the pedestal and a deflector plate assembly is provided above the ion-neutral shield.
222
Patent
Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
Richard Lewington,Michael N. Grimbergen,Khiem K. Nguyen,Darin Bivens,Madhavi R. Chandrachood,Ajay Kumar +5 more
- 30 Oct 2006
TL;DR: In this paper, a plasma reactor for etching a workpiece such as a rectangular or square mask is described, which includes a vacuum chamber having a ceiling and a sidewall and a wafer support pedestal within the chamber, the surface comprising plural respective zones, the respective zones of the surface being formed of respective materials of different electrical characteristics.
84
Patent
Plasma reactor with a dynamically adjustable plasma source power applicator
Madhavi R. Chandrachood,Richard Lewington,Darin Bivens,Ashok Kumar,Ibrahim M. Ibrahim,Michael N. Grimbergen,Renee Koch,Sheeba J. Panayil +7 more
- 02 May 2007
TL;DR: In this paper, a workpiece support pedestal inside the chamber and generally facing the ceiling is used to support the workpiece in a plasmon reactor for processing a work piece, and a tilt apparatus supporting at least the outer applicator portion and capable of rotating the inner applicator about a radial axis perpendicular to the axis of symmetry.
19
Patent
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another
Madhavi R. Chandrachood,Richard Lewington,Darin Bivens,Ashok Kumar,Ibrahim M. Ibrahim,Michael N. Grimbergen,Renee Koch,Sheeba J. Panayil +7 more
- 03 May 2006
TL;DR: In this paper, the authors proposed a method for processing a workpiece in a plasma reactor chamber having radially inner and outer source power applicators at a ceiling of the chamber facing the workpiece.
18
Patent
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another
Madhavi R. Chandrachood,Richard Lewington,Darin Bivens,Ashok Kumar,Ibrahim M. Ibrahim,Michael N. Grimbergen,Renee Koch,Sheeba J. Panayil +7 more
- 03 May 2006
TL;DR: In this paper, a workpiece support pedestal is used to tilt either the inner or outer applicator about a radial axis perpendicular to the vertical axis of symmetry and rotate the workpiece about the axis of symmetric symmetry.
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