Daniel S. Hall
University of Texas at Austin
2 Papers
58 Citations
Daniel S. Hall is an academic researcher from University of Texas at Austin. The author has contributed to research in topics: Photoresist & Polymer blend. The author has an hindex of 2, co-authored 2 publications.
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Papers
Polymers for 157-nm photoresist applications: a progress report
Kyle Patterson,Mikio Yamachika,Raymond J. Hung,Colin J. Brodsky,Shintaro Yamada,Mark Somervell,Brian Osborn,Daniel S. Hall,Gordana Dukovic,Jeffrey Byers,Will Conley,C. Grant Willson +11 more
- 23 Jun 2000
TL;DR: In this article, the design of photoresist matrix resin polymers is broken down into subunits, each of which is responsible for a required function in the final material, and the authors have begun collecting gas-phase VUV spectra of these potential subunits to measure their individual absorbance contributions.
Dissolution behavior of fluoroalcohol-substituted polystyrenes
Daniel S. Hall,Brian Osborn,Kyle Patterson,Sean D. Burns,C. Grant Willson +4 more
- 24 Aug 2001
TL;DR: In this article, the dissolution rates of the sample polymers were compared to that of poly(hydroxystyrene) (PHOST) to provide a reference for the measurements, and it was found that hexafluoroalcohol is a promising candidate for incorporation into the design of 157 nm photoresists.