Daniel Hodash
Cornell University
4 Papers
23 Citations
Daniel Hodash is an academic researcher from Cornell University. The author has contributed to research in topics: Ohmic contact & Electron energy loss spectroscopy. The author has an hindex of 4, co-authored 4 publications.
Chat about Author
Papers
High-quality EuO thin films the easy way via topotactic transformation
Thomas Mairoser,Julia A. Mundy,Alexander Melville,Daniel Hodash,Paul Cueva,Rainer Held,Artur Glavic,Jürgen Schubert,David A. Muller,Darrell G. Schlom,A. Schmehl +10 more
TL;DR: A topotactic reduction reaction is exploited to provide a non-ultra-high vacuum (UHV) means of growing highly oriented single crystalline thin films of the easily over-oxidized half-metallic semiconductor europium monoxide (EuO) with a perfection rivalling that of the best films ofthe same material grown by molecular-beam epitaxy or UHV pulsed-laser deposition.
Hetero-epitaxial EuO Interfaces Studied by Analytic Electron Microscopy
Julia A. Mundy,Daniel Hodash,Alexander Melville,Rainer Held,Thomas Mairoser,David A. Muller,Lena F. Kourkoutis,A. Schmehl,Darrell G. Schlom +8 more
TL;DR: In this article, electron energy loss spectroscopy was used to identify the presence of europium silicides and regions of disorder at the EuO|Si interfaces, imperfections that could significantly reduce spin injection efficiencies via spin flip scattering.
27
Hetero-epitaxial EuO interfaces studied by analytic electron microscopy
Julia A. Mundy,Daniel Hodash,Alexander Melville,Rainer Held,Thomas Mairoser,David A. Muller,Lena F. Kourkoutis,A. Schmehl,Darrell G. Schlom +8 more
TL;DR: In this article, electron energy loss spectroscopy was used to identify the presence of europium silicides and regions of disorder at the EuO|Si interfaces, imperfections that could significantly reduce spin injection efficiencies via spin flip scattering.
23
Exploring the intrinsic limit of the charge-carrier-induced increase of the Curie temperature of Lu- and La-doped EuO thin films
Rainer Held,Thomas Mairoser,A. Melville,Julia A. Mundy,Megan E. Holtz,Daniel Hodash,Zhe Wang,John T. Heron,S. T. Dacek,Bernhard Holländer,David A. Muller,Darrell G. Schlom,Darrell G. Schlom +12 more
TL;DR: In this article, a low-temperature growth method for depositing high-quality Lu-doped EuO films was used to achieve high dopant activation values of up to 67%.
11