다중혈관 관상동맥 환자에서 y-문합을 이용하여 양쪽 내흉동맥만을 사용한 우회술의 조기 성적

Quantum computing hardware technologies have advanced during the past two decades, with the goal of building systems that can solve problems that are intractable on classical computers. The ability to realize large-scale systems depends on major advances in materials science, materials engineering, and new fabrication techniques. We identify key materials challenges that currently limit progress in five quantum computing hardware platforms, propose how to tackle these problems, and discuss some new areas for exploration. Addressing these materials challenges will require scientists and engineers to work together to create new, interdisciplinary approaches beyond the current boundaries of the quantum computing field.

Materials challenges and opportunities for quantum computing hardware

https://www.nature.com/articles/s41928-022-00727-9.pdf

Qubits made by advanced semiconductor manufacturing

The most promising quantum algorithms require quantum processors that host millions of quantum bits when targeting practical applications1. A key challenge towards large-scale quantum computation is the interconnect complexity. In current solid-state qubit implementations, an important interconnect bottleneck appears between the quantum chip in a dilution refrigerator and the room-temperature electronics. Advanced lithography supports the fabrication of both control electronics and qubits in silicon using technology compatible with complementary metal oxide semiconductors (CMOS)2. When the electronics are designed to operate at cryogenic temperatures, they can ultimately be integrated with the qubits on the same die or package, overcoming the ‘wiring bottleneck’3–6. Here we report a cryogenic CMOS control chip operating at 3 kelvin, which outputs tailored microwave bursts to drive silicon quantum bits cooled to 20 millikelvin. We first benchmark the control chip and find an electrical performance consistent with qubit operations of 99.99 per cent fidelity, assuming ideal qubits. Next, we use it to coherently control actual qubits encoded in the spin of single electrons confined in silicon quantum dots7–9 and find that the cryogenic control chip achieves the same fidelity as commercial instruments at room temperature. Furthermore, we demonstrate the capabilities of the control chip by programming a number of benchmarking protocols, as well as the Deutsch–Josza algorithm10, on a two-qubit quantum processor. These results open up the way towards a fully integrated, scalable silicon-based quantum computer. A cryogenic CMOS control chip operating at 3 K is used to demonstrate coherent control and simple algorithms on silicon qubits operating at 20 mK.

CMOS-based cryogenic control of silicon quantum circuits.

Semiconductor science and technology (S T) is a very active branch in the field of natural science, and is also a typical example embodying the development of advanced S T. The Nobel prize for physics is a prize of the highest honour in the world, and there are certain relationships between this award and semiconductor S T. We explore and analyze these inherent relationships which have practical importance for our understanding of the development of semiconductor S T and for predicting its future.

Semiconductor science and technology, and Nobel physics prizes

We investigate the structural and quantum transport properties of isotopically enriched Si28/SiO228 stacks deposited on 300-mm Si wafers in an industrial CMOS fab. Highly uniform films are obtained with an isotopic purity greater than 99.92%. Hall-bar transistors with an oxide stack comprising 10 nm of Si28O2 and 17 nm of Al2O3 (equivalent oxide thickness of 17 nm) are fabricated in an academic cleanroom. A critical density for conduction of 1.75×1011cm-2 and a peak mobility of 9800cm2/Vs are measured at a temperature of 1.7 K. The Si28/SiO228 interface is characterized by a roughness of Δ=0.4nm and a correlation length of Λ=3.4nm. An upper bound for valley splitting energy of 480μeV is estimated at an effective electric field of 9.5 MV/m. These results support the use of wafer-scale Si28/SiO228 as a promising material platform to manufacture industrial spin qubits.

/pdf/quantum-transport-properties-of-industrial-si-28-si-o-2-28-3q7t2k8dre.pdf

Quantum Transport Properties of Industrial Si 28 / Si O 2 28

We investigate the structural and quantum transport properties of isotopically enriched $^{28}$Si/$^{28}$SiO$_2$ stacks deposited on 300 mm Si wafers in an industrial CMOS fab. Highly uniform films are obtained with an isotopic purity greater than 99.92\%. Hall-bar transistors with an equivalent oxide thickness of 17 nm are fabricated in an academic cleanroom. A critical density for conduction of $1.75\times10^{11}$ cm$^{-2}$ and a peak mobility of 9800 cm$^2$/Vs are measured at a temperature of 1.7 K. The $^{28}$Si/$^{28}$SiO$_2$ interface is characterized by a roughness of $\Delta=0.4$ nm and a correlation length of $\Lambda=3.4$ nm. An upper bound for valley splitting energy of 480 $\mu$eV is estimated at an effective electric field of 9.5 MV/m. These results support the use of wafer-scale $^{28}$Si/$^{28}$SiO$_2$ as a promising material platform to manufacture industrial spin qubits.

/pdf/quantum-transport-properties-of-industrial-28-si-28-sio-2-3pczb9kkfc.pdf

Quantum transport properties of industrial $^{28}$Si/$^{28}$SiO$_2$.

Enrichment of the spin-zero $^{28}$Si isotope drastically reduces spin-bath decoherence in silicon and has enabled solid state spin qubits with extremely long coherence and high control fidelity. The limited availability of isotopically enriched $^{28}$Si in industrially adopted forms, however, is a major bottleneck to leverage CMOS technology for manufacturing qubits with the quality and in the large numbers required for fault tolerant quantum computation. Here we show wafer-scale epitaxial growth of isotopically enriched $^{28}$Si/$^{28}$SiO$_2$ stacks in an industrial CMOS fab, and demonstrate highly uniform films with an isotopic purity greater than $99.92\%$. We induce a two dimensional electron gas, the cornerstone of silicon spin qubit architectures, at the isotopically enriched semiconductor/oxide interface by electrical gating. To confirm the high quality growth, we perform electrical probing and show matching properties for fin transistors in $^{28}$Si and natural Si, fabricated using the same high volume manufacturing process. Quantum transport measurements at cryogenic temperature validate wafer-scale $^{28}$Si as a suitable material to host qubits. The establishment of an industrial supply of isotopically enriched Si, previously thought to be a major hurdle, provides the foundation for high volume manufacturing of long-lived spin qubits.

Wafer-scale silicon for quantum computing

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Quantum Transport Properties of Industrial Si 28 / Si O 2 28

Quantum transport properties of industrial $^{28}$Si/$^{28}$SiO$_2$.

Wafer-scale silicon for quantum computing