Plasma-material interactions in TFTR

First-wall conditioning for enhanced confinement discharges and the DT experiments in TFTR

Ti–Si–C films were synthesized on WC–Co substrate by a plasma-enhanced chemical vapor deposition (PECVD) technique using a gaseous mixture of TiCl4, SiH4, CH4, Ar, and H2. Effects of process parameters, such as deposition temperature and gas ratio, Mx= [SiH4/(SiH4+TiCl4)], on the microstructure and mechanical properties were systematically investigated in this work. From instrumental analyses of HRTEM, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD), it was concluded that the Ti–Si–C film was a fine composite of TiC crystallites with amorphous SiC phase. The Si addition caused a microstructural modification of the TiC film to the fine composite with TiC crystal size refinement by interpenetration of amorphous SiC phase among TiC crystallites. The microhardness of the Ti–Si–C film increased from ∼22 GPa of TiC to ∼33 GPa at Si content of 5.2 at.%. In addition, the average friction coefficient against steel decreased from 0.4 of TiC film to 0.28 of Ti–Si–C film containing 5.2 at.% Si. The microhardness value of Ti–Si–C film was largely dependent on the deposition temperature.

Syntheses and mechanical properties of Ti–B–C–N coatings by a plasma-enhanced chemical vapor deposition

In a future D/T fusion reactor the walls of the vessel containing the magnetically confined hot plasma have to stand simultaneously very high power, particle and neutron loads. In today’s high temperature plasma experiments at the areas of the highest load, i.e. the divertor and the limiters, W, Mo and Carbon (CFC) are used and Be, W, Mo, Inconel and stainless steel are at the other wall areas. These materials are also envisaged for future bigger fusion experiments, such as ITER [1–3]. The resistance of these materials to the different expected higher loads in a fusion reactor is only partly known and more investigations are needed with respect to find better materials and/or a modification of the divertor.

/pdf/plasma-facing-materials-for-fusion-devices-nzrfa3uctp.pdf

Plasma-Facing Materials for Fusion Devices

Material behavior and materials problems in TFTR

Initial limiter and getter operation in TFTR

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Initial limiter and getter operation in TFTR