D.F Franceschini
Federal Fluminense University
7 Papers
104 Citations
D.F Franceschini is an academic researcher from Federal Fluminense University. The author has contributed to research in topics: Plasma-enhanced chemical vapor deposition & Raman spectroscopy. The author has an hindex of 5, co-authored 7 publications.
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Papers
Film growth and relationship between microstructure and mechanical properties of a-C:H:F films deposited by PECVD
TL;DR: In this article, the effects of some deposition parameters (partial pressure of CF4 and self-bias voltage) on the microstructure, mechanical and tribological properties of a-C:H:F films are presented.
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Fluorine incorporation into amorphous hydrogenated carbon films deposited by plasma-enhanced chemical vapor deposition: structural modifications investigated by X-ray photoelectron spectrometry and Raman spectroscopy
M.E.H. Maia da Costa,F. L. Freire,Luiz G. Jacobsohn,D.F Franceschini,Gino Mariotto,I.R.J Baumvol +5 more
TL;DR: In this article, the carbon chemical environment was investigated by X-ray photo-electron spectroscopy (XPS), while structural changes in the carbon matrix were probed by Raman spectra.
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Hydrogenated Carbon-Nitrogen Films Obtained by Pecvd using Acetylene and Nitrogen as Precursor Gases
TL;DR: In this paper, amorphous hydrogenated carbon-nitrogen films were deposited by plasma enhanced chemical vapor deposition (PECVD) using acetylene-nipprogen mixtures, and atomic composition and density of the films were determined by Rutherford backscattering spectrometry (RBS) and elastic recoil detection (ERDA).
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Deposition of hard amorphous hydrogenated carbon films by radiofrequency parallel-plate hollow-cathode plasmas
G. Capote,Luiz G. Jacobsohn,M.D. Michel,Carlos Maurício Lepienski,A.L. Vieira,D.F Franceschini +5 more
TL;DR: In this article, hard amorphous hydrogenated carbon (a-C:H) films were deposited by plasma decomposition of CH 4 gas in a RF parallel-plate hollow-cathode system.
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Surface modifications in diamond-like carbon films submitted to low-energy nitrogen ion bombardment
TL;DR: In this paper, amorphous hydrogenated carbon films (a-C:H) were submitted to nitrogen r.f.-plasma treatment and the influence of several parameters was investigated: the chamber pressure, the self-bias voltage in the range between −50 and −500 V and the exposure time.
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