Chunsheng E
University of Houston
22 Papers
167 Citations
Chunsheng E is an academic researcher from University of Houston. The author has contributed to research in topics: Magnetic anisotropy & Patterned media. The author has an hindex of 8, co-authored 22 publications.
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Papers
Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications
Vishal Parekh,Chunsheng E,Darren Smith,Ariel Ruiz,John C. Wolfe,Paul Ruchhoeft,Erik B. Svedberg,Sakhrat Khizroev,Dmitri Litvinov +8 more
TL;DR: An approach to fabrication of a patterned magnetic recording medium for next-generation data storage systems is presented in this article, where the multilayer films deposited on a Ta seed layer enable high intergranular exchange coupling.
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Physics of patterned magnetic medium recording: Design considerations
TL;DR: In this paper, the effects of bit geometry, medium thickness, head/medium magnetic spacing, air-bearing surface geometry, write pole material, and write misregistration on magnetization reversal are explored.
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Magnetization reversal and magnetic anisotropy in patterned Co/Pd multilayer thin films
Darren Smith,Vishal Parekh,Chunsheng E,Shishan Zhang,Wolfgang Donner,T. Randall Lee,Sakhrat Khizroev,Dmitri Litvinov +7 more
TL;DR: In this paper, (Co/Pd)N multilayers are deposited by magnetron sputtering and patterned into large periodic arrays of 200 nm islands to enable controlled domain wall injection for quantitative comparison of magnetic anisotropy energies.
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Recording Physics, Design Considerations, and Fabrication of Nanoscale Bit-Patterned Media
Dmitri Litvinov,Vishal Parekh,Chunsheng E,Darren Smith,James Rantschler,Paul Ruchhoeft,Dieter Weller,Sakhrat Khizroev +7 more
TL;DR: In this paper, bit patterning was accomplished using ion-beam proximity printing, a high-throughput direct write lithography where a large array of ion beamlets shaped by a stencil mask is used to write an arbitrary device pattern.
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He+ ion irradiation study of continuous and patterned Co∕Pd multilayers
TL;DR: Ion irradiation of continuous and patterned (Co∕Pd)n magnetic multilayer films has been studied as a mean to control magnetic anisotropy as well as to evaluate possible ion irradiation damage involved in ion-beam proximity lithography patterning as mentioned in this paper.
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