Chen Wang
Technical University of Madrid
13 Papers
8 Citations
Chen Wang is an academic researcher from Technical University of Madrid. The author has contributed to research in topics: Calibration & Metrology. The author has an hindex of 4, co-authored 7 publications.
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Papers
Comparison of methods for outlier identification in surface characterization
Chen Wang,J. Caja,E. Gómez +2 more
TL;DR: Ten statistical methods for outlier identification which can be implemented in the area of surface metrology are analysed and compared and their corresponding algorithms for data pre-processing before surface characterization are developed.
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Elimination of Quadratic Phase Aberration in Digital Holographic Microscopy by Using Transport of Intensity
TL;DR: In this paper , the authors proposed to reconstruct 3D images by combining the merits of transport of intensity and digital holography by solving the transport-of-intensity equation by using digital holographic reconstructed images as inputs.
Characterization and Correction of the Geometric Errors Using a Confocal Microscope for Extended Topography Measurement, Part II: Experimental Study and Uncertainty Evaluation
TL;DR: In this paper, the authors present the experimental implementations of the mathematical models and algorithms developed in Part I. The experimental results demonstrate that their method for the correction of the errors produced by the movement of the lateral stage of a confocal microscope is meaningful and practicable.
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A Measurement System with High Precision and Large Range for Structured Surface Metrology Based on Atomic Force Microscope
TL;DR: In this paper , the authors proposed a metrological measurement system based on a commercial atomic force microscope, which has a measurement range from 110m × 110μm × 20 μm to 25 mm × 25mm × 5 mm.
A phase-based reconstruction optimization method for digital holographic measurement of microstructures
Chen Wang,Weikang Wang,Jiasi Wei,JunJie Wu,Xiangchao Zhang,Huadong Zheng,Famin Wang,Yingjie Yu +7 more
Abstract: Digital holography has transformative potential in measuring stacked-chip microstructures due to its noninvasive, single-shot, full-field characteristics. However, uncertainties in reconstruction distance inevitably lead to resolving blur and reconstruction distortion. Herein, we propose a phase-based reconstruction optimization method that consists of a phase-evaluation function and a structured surface-characterization model. Our proposed method involves setting a reconstruction distance range, obtaining phase information using sliced numerical reconstruction, and optimizing the reconstruction distance by finding the extreme value of the function, which identifies the focal plane of the reconstructed image. The structure of the surface topography is then characterized using the characterization model. We perform simulations of the recording, reconstruction, and characterization to verify the effectiveness of the proposed method. To further demonstrate the approach, a simple holographic recording system is constructed to measure a standard resolution target, and the measurement results are compared with a commercial instrument. The simulation and experiment demonstrate, respectively, 31.16% and 34.41% improvement in step-height characterization accuracy.
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