C. Keyser
University of Central Florida
22 Papers
96 Citations
C. Keyser is an academic researcher from University of Central Florida. The author has contributed to research in topics: Laser & Extreme ultraviolet. The author has an hindex of 9, co-authored 17 publications. Previous affiliations of C. Keyser include United States Naval Research Laboratory.
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Papers
High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography
TL;DR: In this article, a mass-limited Sn-based laser plasma source with 1.2% conversion efficiency was used for extreme ultraviolet lithography, and an enhanced repeller field configuration showed marked improvement in mitigating debris.
Studies of high-repetition-rate laser plasma EUV sources from droplet targets
TL;DR: In this paper, a dual experimental and theoretical study was conducted to analyze the interaction physics between the laser light and the target, and the hydrodynamic laser plasma simulation code, Medusa103, was used to model the electron density distribution for comparison to electron density distributions obtained through Abel inversion of plasma interferograms.
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Laser plasma EUVL sources: progress and challenges
Martin Richardson,Chiew-Seng Koay,Kazutoshi Takenoshita,C. Keyser,Simi George,Somsak Teerawattansook,Moza M. Al-Rabban,Howard A. Scott +7 more
- 20 May 2004
TL;DR: The most pressing technical issue for the success of EUV lithography is the provision of a high repetition-rate source having sufficient brightness, lifetime, and with sufficiently low off-band heating and particulate emissions characteristics to be technically and economically viable as discussed by the authors.
High-conversion-efficiency tin material laser-plasma source for EUVL
Chiew-Seng Koay,C. Keyser,Kazutoshi Takenoshita,Etsuo Fujiwara,Moza M. Al-Rabban,Moza M. Al-Rabban,Martin Richardson,I. C. Edmond Turcu,Harry Rieger,A. Stone,James H. Morris +10 more
- 13 Jun 2003
TL;DR: In this article, the authors describe experiments and theoretical calculations on a mass-limited laser target design using tin that offers high conversion efficiency for laser-plasma sources for EUVL.
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EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas
Simi George,Chiew-Seng Koay,Kazutoshi Takenoshita,Robert Bernath,Moza M. Al-Rabban,C. Keyser,Vivek Bakshi,Howard A. Scott,Martin Richardson +8 more
- 06 May 2005
TL;DR: In this article, a combined experimental theoretical program is underway to measure and interpret the detailed EUV emission spectra from laser plasmas suitable for EUVL, particularly mass-limited droplet laserplasmas.
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