Resistless nanofabrication by stencil lithography

This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by exploiting Two-Photon Polymerization (2PP) in an IP-L/SU-8 double layer resist system. The process consists of the sequential deposition of two different resists, such as SU-8 and IPL, onto the same glass substrate, followed by 2PP lithography and distinct development processes. The 2PP writing process was used to polymerize structures inside the top and bottom resist layers to form, in one single exposure process, both SSM and a permanent polymeric structure, in our case a plain pedestal. The top IPL resist was developed using Isopropyl Alcohol (IPA), which does not affect either exposed or un-exposed SU-8 regions. In this way, structures written into the bottom layer remained latent, while exposed areas of the top IPL resist, including the stencil mask, were developed. The realization of 3D stencil masks, designed to be anchored inside the un-exposed bottom layer, was combined with metal evaporation to demonstrate the deposition of a plain metal line through the stencil mask. The final development of the bottom layer led to the lift off of the sacrificial stencil mask, uncovering the underlying, permanent polymer-metal structure. The combination of sacrificial polymer structures with permanent ones opens new possibilities in 3D MEMS design, enabling the integration of distributed electronic transducers in flexible polymeric structures.

/pdf/3d-microfabrication-by-two-photon-polymerization-of-an-4hb4ve981x.pdf

3D-microfabrication by two-photon polymerization of an integrated sacrificial stencil mask

Large-area and dense arrays of nanometric scale structures are commonly fabricated for several applications. The characterisation of sub-micron structures (below 1 μm) at a large scale as well as the related data analysis are challenging tasks. Here, we present a method to address the image acquisition, the data extraction and the data analysis, applied to the evaluation of the uniformity of nanometric structures in a silicon master. Automated routines for both high and low magnification Scanning Electron Microscope (SEM) imaging have been successfully developed. SEM images have been automatically acquired by scripting routines, which collect large amounts of images of the nanometric structures covering multiple regions of the wafer in a few hours. Geometric parameters of the nanometric structures such as diameter, period and height have been extracted from the raw images using the developed image processing scripts. Finally, the data extracted from more than 4800 images acquired with three different characterisation scripts (1600 images for each study) have been analysed and plotted according to their position in the wafer.

Automated characterisation and analysis of large arrays of nanostructures fabricated at wafer scale

Site-selective deposition of aerosol Pd nanoparticles on a substrate was employed to fabricate nanoscale Ag dots and rings through a subsequent electroless deposition. The fabricated nanoscale dot and ring arrays respectively showed properties in surface-enhanced Raman (SER, with a 1.8 × 105 enhancement factor) and Fourier transform near infrared (FT-NIR, at 6153 cm−1 absorption band) spectra.

An aerosol-based soft lithography to fabricate nanoscale silver dots and rings for spectroscopic applications

— This paper reports a novel shadow mask aligner, which is capable of aligning planar with ~ 1 µm alignment error as well as provision to compensate the wedge error by using movements of three precision linear actuators, spotted under optical microscope. The use of three points leveling also overcomes the common error of the upper assembly bending, which could occur with time after its continuous use. The reported wafer/ mask holding mechanism is able to accommodate substrates of 3"to 6" diameter. The unique magnetic clamping mechanism after alignment has been successfully demonstrated. The fabricated system is useful for alignment of mask and wafer, as well as for other applications like nano-imprint and micro-contact printing lithography. In these cases, moulds/ stamp is aligned with the patterned/ un-patterned target substrate; to create complex 3D structures micro-assembly of independently fabricated 2D components by proper aligning and clamping.

https://iopscience.iop.org/article/10.1088/2631-8695/ab7153/pdf

A novel shadow mask aligner based on three points levelling for wedge error compensation

The standard lithographic techniques to fabricate electronic components involve the use of polymers, baking steps and chemicals. This typically restricts their application to flat substrates made up of standard materials. Stencil lithography has been proposed as a stable alternative to the standard lithographic techniques. In this paper, we demonstrate the completely resistless all-through-stencil fabrication of electronic components, by performing all essential fabrication steps—implantation, etching and metallization—using stencil lithography. This is performed on a planar substrate as well as on pre-patterned 3D substrates, thus showing the potential of this technique for applications in the field of accelerometers, pressure, gas and radiation sensors.

https://iopscience.iop.org/article/10.1088/0960-1317/22/9/095022/pdf

All-stencil transistor fabrication on 3D silicon substrates

Handle everyday research tasks with reliable, citation-backed results

Your personal Research Agent to handle research tasks with citation-backed results

Popular Tasks used by Researchers

How can I help with your research?

Meet SciSpace

Get more enhanced response by uploading the PDFs you want me to reference.

No relevant PDFs in your library

SciSpace is the AI research assistant for academics. Run systematic literature reviews on 280M+ papers, and write papers with cited sources. Trusted by 1M+ students, PhDs & researchers.

SciSpace | AI for Research

Analyze PDFs

Code & Manuscripts

Funding & Grants

Literature & Patents

Medical & Clinical Data

Systematic Review

Visualize & Present

Web & Data

Build a Google Scholar-like website for your research.

Build a website

Create charts and images for your research

Create a Chart

Write a paper for submission to a journal

Draft a manuscript

Patent Search

Design eye-catching scientific posters in minutes.

Scientific Poster Generation

Systematic Literature Review

One task is running at the moment. Your messages will be shown right after.

Drag and drop or click here to browse

Loved by <highlight>1 million+</highlight> researchers

Extract a list of specific topics and their sources from unstructured text

Topics

Compare and analyze relevant papers that matches with your search

Papers

Get insights from PDFs and bookmarked papers from your library

My library

Recent searches

Try searching for:

Catch AI-generated content in scholarly and non-scholarly content

{ai} Detector

Ai Writer

Get PDF Summaries, highlighted text explanations 

Chat with PDF

Effortlessly create in-text citations and bibliographies in APA and 2,500 other formats

Citation generator

Get explanations, summaries, and answers on academic papers

Ease up your research workflow with {scispace}'s cohort of exciting AI tools

Elevate your academic writing skills and convey your ideas the way you want

Paraphraser

Explore our range of reading and writing tools

Your file is being prepared and should be ready in a few minutes. If it's a large file, it might take a bit longer. You can close this window, and we'll email you the file when it's done.

You have reached a maximum limit of <strong>{limit}</strong> columns in the table. Remove at least <strong>1</strong> column to add or create another one.

C Hibert

Author Tools

Chat about Author

Papers

All-stencil transistor fabrication on 3D silicon substrates