Brian Osborn
University of Texas at Austin
21 Papers
332 Citations
Brian Osborn is an academic researcher from University of Texas at Austin. The author has contributed to research in topics: Resist & Polymer. The author has an hindex of 10, co-authored 21 publications.
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Papers
Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results
Hoang Vi Tran,Raymond J. Hung,Takashi Chiba,Shintaro Yamada,Thomas Mrozek,Yu-Tsai Hsieh,Charles R. Chambers,Brian Osborn,Brian C. Trinque,Matthew J. Pinnow,Scott A. MacDonald,C. Grant Willson,Daniel P. Sanders,Eric Connor,Robert H. Grubbs,Will Conley +15 more
TL;DR: In this paper, metal-catalyzed vinyl addition copolymers derived from partially fluorinated norbornenes and tricyclononenes were synthesized and evaluated for use in formulating photoresists for 157 nm lithography imaging.
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Polymers for 157-nm photoresist applications: a progress report
Kyle Patterson,Mikio Yamachika,Raymond J. Hung,Colin J. Brodsky,Shintaro Yamada,Mark Somervell,Brian Osborn,Daniel S. Hall,Gordana Dukovic,Jeffrey Byers,Will Conley,C. Grant Willson +11 more
- 23 Jun 2000
TL;DR: In this article, the design of photoresist matrix resin polymers is broken down into subunits, each of which is responsible for a required function in the final material, and the authors have begun collecting gas-phase VUV spectra of these potential subunits to measure their individual absorbance contributions.
Metal-Catalyzed Addition Polymers for 157 nm Resist Applications. Synthesis and Polymerization of Partially Fluorinated, Ester-Functionalized Tricyclo[4.2.1.02,5]non-7-enes
Daniel P. Sanders,Eric Connor,Robert H. Grubbs,Raymond J. Hung,Brian Osborn,Takashi Chiba,Scott A. MacDonald,C. Grant Willson,Will Conley +8 more
TL;DR: Fluorinated tricyclonononene (TCN) structures with ester substituents exhibit up to 3 orders of magnitude more transparency at 157 nm than conventional ester-functionalized norbornene structures as determined by gas-phase vacuum-ultraviolet spectroscopy and variable angle spectroscopic ellipsometry as mentioned in this paper.
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The Design of Resist Materials for 157nm Lithography
C. Grant Willson,Brian C. Trinque,Brian Osborn,Charles R. Chambers,Yu Tsai Hsieh,Takashi Chiba,Paul Zimmerman,Daniel Miller,Willard E. Conley +8 more
TL;DR: In this article, the synthesis and characterization of several new fluoropolymers designed for use in the formulation of photoresists for exposure at 157nm was described, based on learning from previously reported fluorine-containing materials.
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Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system
TL;DR: In this paper, the authors investigated top surface imaging systems based on vapor phase silylation for use at a variety of wavelengths, including 193 nm and EUV, and found that poly(p-hydroxystyrene) resins have a combination of properties that limit their utility in this application.