Breiling Patrick G
Lam Research
11 Papers
113 Citations
Breiling Patrick G is an academic researcher from Lam Research. The author has contributed to research in topics: Substrate (printing) & Pedestal. The author has an hindex of 4, co-authored 11 publications.
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Papers
Patent
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
Breiling Patrick G,Ramesh Chandrasekharan,Karl Leeser,Paul Konkola,Adrien Lavoie,Chloe Baldasseroni,Shankar Swaminathan,lshtak Karim,Yukinori Sakiyama,Edmund B Minshall,Sung Je Kim,Andrew Duvall,Frank L. Pasquale +12 more
- 14 Dec 2016
TL;DR: In this article, a substrate processing system includes a first chamber including a substrate support and a showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source.
64
Patent
Multi-plenum showerhead with temperature control
Breiling Patrick G,Bhadri N. Varadarajan,Jennifer L. Petraglia,Bart van Schravendijk,Karl Leeser,Mandyam Sriram,Batzer Rachel +6 more
- 03 Jul 2013
TL;DR: In this paper, an apparatus for use with radical sources for supplying radicals during semiconductor processing operations is described, including a stack of plates or components that form a faceplate assembly.
33
Patent
Plasma suppression behind a showerhead through the use of increased pressure
Breiling Patrick G,Ramesh Chandrasekharan,Edmund B Minshall,Colin F. Smith,Andrew Duvall,Karl Leeser +5 more
- 10 Mar 2016
TL;DR: In this article, a substrate processing system includes a showerhead including a stem portion and a head portion, and the head portion is arranged to provide process gases from the process gas source to a reaction volume of a processing chamber below the showerhead to generate plasma in the reaction volume.
6
Patent
Multi-chamber sprayer with temperature controller
Van Schravendijk Bart J,Breiling Patrick G,Jennifer L. Petraglia,Bhadri N. Varadarajan,Karl Leeser,Sriram Mandyamammanjee,Batzer Rachel +6 more
- 20 Aug 2014
TL;DR: In this paper, a multi-chamber sprayer with temperature controller was used along with free base source in order to supply the free base during the semiconductor processing operation, where the heat insulation device can regulate the heat flow between the free diffusion plate and the precursor transmission plate.
4
Patent
Planar substrate edge contact with open volume equalization pathways and side containment
Breiling Patrick G,Ramesh Chandrasekharan,Karl Leeser,Paul Konkola,Adrien Lavoie,Chloe Baldasseroni,Shankar Swaminathan,lshtak Karim,Yukinori Sakiyama,Edmund B Minshall,Sung Je Kim,Andrew Duvall,Frank L. Pasquale +12 more
- 03 May 2018
TL;DR: A pedestal for a substrate processing system includes a pedestal body including a substrate-facing surface as discussed by the authors, where an annular band is arranged on the substratefacing surface that is configured to support a radially outer edge of the substrate.
2