Embodiments of the present disclosure generally relate to an apparatus and method for reducing particle generation in a processing chamber. In one embodiment, the methods generally includes generating a plasma between a powered top electrode and a grounded bottom electrode, wherein the top electrode is parallel to the bottom electrode, and applying a constant zero DC bias voltage to the powered top electrode during a film deposition process to minimize the electrical potential difference between the powered top electrode and the plasma and/or the electrical potential difference between the grounded bottom electrode and the plasma. Minimizing the electrical potential difference between the plasma and the electrodes reduces particle generation because the acceleration of the ions in the sheath region of the electrodes is reduced and the collision force of the ions with the protective coating layer on the electrodes is minimized. Therefore, particle generation on the substrate surface is reduced.

Particle generation suppresor by dc bias modulation

A coating system includes a vacuum chamber and a coating assembly. The coating assembly includes a vapor source, a substrate holder, a remote anode electrically coupled to the cathode target, and a cathode chamber assembly. The cathode chamber assembly includes a cathode target, an optional primary anode and a shield which isolates the cathode target from the vacuum chamber. The shield defines an opening for transmitting an electron emission current of a remote arc discharge from the cathode target to the remote anode that streams along the target face long dimension. A primary power supply is connected between the cathode target and the primary anode while a secondary power supply is connected between the cathode target and the remote anode. Characteristically, a linear remote anode dimension and a vapor source short dimension are parallel to a dimension in which an arc spot is steered along the cathode target.

Low pressure arc plasma immersion coating vapor deposition and ion treatment

A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode. The coating system also includes a primary power supply connected between the cathode and the primary anode and a secondary power supply connected between the cathode chamber assembly and the remote anode. A method using the coating system is also provided.

Remote arc discharge plasma assisted processes

An apparatus for the manufacture of at least substantially hydrogen-free ta-C layers on substrates, which includes a vacuum chamber, which is connectable to an inert gas source and a vacuum pump, a support device in the vacuum chamber, at least one graphite cathode having an associated magnet arrangement forming a magnetron that serves as a source of carbon material, a bias power supply for applying a negative bias voltage to the substrates on the support device, at least one cathode power supply for the cathode, which is connectable to the at least one graphite cathode and to an associated anode and which is designed to transmit high power pulse sequences spaced at intervals of time, with each high power pulse sequence comprising a series of high frequency DC pulses adapted to be supplied, optionally after a build-up phase, to the at least one graphite cathode.

Apparatus and Method for depositing Hydrogen-free ta C Layers on Workpieces and Workpiece

A sliding element, and in particular a piston ring, is provided with a DLC coating on a substrate of the sliding element. A material softer than DLC is embedded into the surface of the DLC coating with which the sliding element will come into contact with a sliding partner, against which the sliding element will slide.

Sliding element with dlc coating

Vacuum treatment installation or vacuum treatment method for carrying out a plasma method, wherein the treatment is carried out in a vacuum chamber, in which are disposed a device for generating an electric low voltage arc discharge (NVBE) comprised of a cathode and an anode electrically interconnectable with the cathode via an arc generator, and a workpiece carrier electrically interconnectable with a bias generator for receiving and moving workpieces, as well as at least one feed for inert and/or reactive gas. At least a portion of the surface of the anode is therein fabricated of graphite and is operated at high temperature.

Vacuum Treatment Installation and Vacuum Treatment Method

Vacuum treatment unit and vacuum treatment process for carrying out a plasma process, wherein the treatment is carried out in a vacuum chamber (1) in which an apparatus for producing an electric low-voltage arc discharge (15) (LVAD), comprising a cathode (10) and an anode (13) which can be electrically connected to the cathode via an arc generator, and a workpiece support (7) for accommodating and moving workpieces (2) which can be electrically connected to a bias generator (16) and also at least one feed line (8) for inert and/or reactive gas are arranged. Here, at least part of the surface of the anode is made of graphite and is operated at high temperature.

Vacuum treatment unit and vacuum treatment process

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Vacuum Treatment Installation and Vacuum Treatment Method

Vacuum treatment unit and vacuum treatment process