Real-time changes in the composition and structure of bismuth electrodes used for catalytic conversion of CO2 into CO were examined via X-ray absorption spectroscopy (including XANES and EXAFS), electrochemical quartz crystal microbalance (EQCM), and in situ X-ray reflectivity (XR). Measurements were performed with bismuth electrodes immersed in acetonitrile (MeCN) solutions containing a 1-butyl-3-methylimidazolium ([BMIM]+) ionic liquid promoter or electrochemically inactive tetrabutylammonium supporting electrolytes (TBAPF6 and TBAOTf). Altogether, these measurements show that bismuth electrodes are originally a mixture of bismuth oxides (including Bi2O3) and metallic bismuth (Bi0) and that the reduction of oxidized bismuth species to Bi0 is fully achieved under potentials at which CO2 activation takes place. Furthermore, EQCM measurements conducted during cyclic voltammetry revealed that a bismuth-coated quartz crystal exhibits significant shifts in resistance (ΔR) prior to the onset of CO2 reduction n...

Structural Dynamics and Evolution of Bismuth Electrodes during Electrochemical Reduction of CO2 in Imidazolium-Based Ionic Liquid Solutions

Effects of specific surface area of electrode and different electrolyte on capacitance properties in nano porous-structure CrN thin film electrode for supercapacitor

Chromium films were deposited by cooled and hot target magnetron sputtering techniques with unbalanced magnetic field configuration at equal target power density. The dependence of deposition rates of Cr films by the hot target magnetron sputtering on the power density was a non-linear at 27.5–31.5 W/cm2. The optical emission studies indicated the enhancement of deposition rates due to the evaporation of the hot Cr target. The chromium film structure was strongly depended on the factor of «hot target» and the target power density. Cr films were structured to (110) direction in the case of the hot target sputtering, for cooled target configuration – the preferred orientation was changed from (110) to (200) with the power density. Cr+ to Cr ratio and heat flow from the cathode to the substrate influenced on the coating hardness and adhesion. The Cr films with 9.84–12.79 GPa and the non-cracking behavior (up to 15 N) were obtained.

High-rate magnetron sputtering with hot target

A comparative study on the properties of chromium coatings deposited by magnetron sputtering with hot and cooled target

This work is an investigation on the operation parameters for Ni films deposition by magnetron sputtering from target working at temperatures higher than the Curie temperature due to magnetic phase transition of the sputtered target, which is partial heat-insulated from the water-cooled magnetron body. The ferro- to paramagnetic transition of the target results in decrease of discharge voltage and rise of discharge current. Thereby, discharge power increases under voltage control mode or hot Ni target sputtering can occur at lower pressures under power control mode. Heating of the Ni target and its ferro- to paramagnetic transition leads to stabilization of the discharge parameters. The changes of the discharge current and power decreased from 10.5% to 2.5% during a single sputtering process under voltage control mode. Moreover, a slight increase of the deposition rates of 20…25% was determined, when hot target sputtering was performed. The XRD assessment showed that Ni films deposited by hot target sputtering have a textured crystal structure with larger grain sizes and lower residual stresses in comparison with cooled Ni target sputtering. When passing from cooled to hot target sputtering, the type of film growth changes from zone 1 to zone T, and surface roughness of Ni films decreased.

Hot target magnetron sputtering for ferromagnetic films deposition

The thin-film electrode for supercapacitors has broad prospects for providing high energy storage capacity. However, the microstructure of dense film resulting in poor ion access limits its capacitance still far below the theoretical value. Here, CrN thin film electrodes with good cycle performance can be prepared by tuning the porosity of the film at the nanoscale level. The atomic diffusion process and atomic peening effect that occur during the sputtering process of chromium nitride are the pivotal parameters for generating porosity and high specific surface area. During the controlled sputtering process, an increase in the nitrogen flow rate causes an increase in the porosity in each column (intracolumnar porosity), while an increase in temperature controlling the gap between two columns (intercolumnar porosity). When the nitrogen flow rate is 10 sccm and the deposition temperature is 250 °C the CrN film has the areal capacitance of 41.7 mF cm−2, 10 mV s−1 at the thickness of 950 nm. In addition, the CrN film has good electrochemical cycling stability, the capacity retention rate is still as high as 93.2% after 20,000 cycles. Therefore, the CrN film electrode has a promising application prospects in energy storage systems such as supercapacitors.

Sputtered chromium nitride films with finely tuned intra- and intercolumnar porosities as pseudocapacitive electrode for supercapacitors

Mechanism for vacuum thermal stabilization of silver in graphite-like carbon coating and performance of electrical conductivity and corrosion resistance

Effect of cluster interface structure on the spontaneous escape behavior of silver in ion plating coatings and its inhibition mechanism

The invention discloses a silver-doped graphite-like carbon coating and a preparation method thereof. The preparation method of the silver-doped graphite-like carbon coating comprises the following steps that (1), a substrate subjected to pretreatment is placed in a vacuum cavity containing a chromium target, a carbon target and a silver target for plasma cleaning; (2), a chromium buffer layer isdeposited on the substrate subjected to the treatment in the step (1) by adopting an ion plating process under the vacuum condition, wherein the chromium target is taken as an evaporation source, andargon is taken as the working gas; (3), the silver-doped graphite-like carbon coating is deposited on the chromium buffer layer obtained in the step (2) by adopting the ion plating process under the vacuum condition, wherein the carbon target and the silver target are taken as evaporation sources, and argon is taken as the working gas; and (4), the vacuum condition keeps unchanged, a heat treatment is carried out on the substrate subjected to the treatment in the step (3), and therefore silver in the graphite-like coating can form short silver wires on the interfaces of carbon clusters, and the silver in the graphite-like coating is agglomerated in the graphite-like coating under the heat treatment condition. According to the method, the spontaneous escape of the silver in the silver-dopedgraphite-like carbon coating can be inhibited.

Ag-Me co-doped graphite-like carbon coating and preparation method thereof

The invention discloses a micro-arc oxidation technology. According to the micro-arc oxidation technology, two different technical methods, namely a micro-arc oxidation growth method and a micro-arc oxidation exfoliation method are generated according to the difference between the regulated pulse parameter of an external circuit and the interpolar field intensity of an internal electric field; themicro-arc oxidation growth process has the advantages that a protective layer can be formed on the metal surface, and the corrosion-resistant and scratch-resistant surface protective performance canbe achieved; and the micro-arc oxidation exfoliation process has the advantages that atomic-scale layer-by-layer exfoliation can be achieved, and the high-standard machining precision requirement of acomplex-curved-surface-shaped key component can be met. The micro-arc oxidation technology has the advantages that by using the methods, the existing problems of the surface protective performance ofmaterials can be solved, and the requirements of precision machining of the materials can be met.

Micro-arc oxidation technology

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