The explosion in the amount of information that is being processed is prompting the need for new computing systems beyond existing electronic computers. Photonic computing is emerging as an attractive alternative due to performing calculations at the speed of light, the change for massive parallelism, and also extremely low energy consumption. We review the physical implementation of basic optical calculations, such as differentiation and integration, using metamaterials, and introduce the realization of all-optical artificial neural networks. We start with concise introductions of the mathematical principles behind such optical computation methods and present the advantages, current problems that need to be overcome, and the potential future directions in the field. We expect that our review will be useful for both novice and experienced researchers in the field of all-optical computing platforms using metamaterials. 

/pdf/computation-at-the-speed-of-light-metamaterials-for-all-21bdlhry.pdf

Computation at the speed of light: metamaterials for all-optical calculations and neural networks

Abstract Flat lenses, including metalens and diffractive lens, have attracted increasing attention due to their ability to miniaturize the imaging devices. However, realizing a large scale achromatic flat lens with high performance still remains a big challenge. Here, we developed a new framework in designing achromatic multi-level diffractive lenses by light coherence optimization, which enables the implementation of large-scale flat lenses under non-ideal conditions. As results, a series achromatic polymer lenses with diameter from 1 to 10 mm are successfully designed and fabricated. The subsequent optical characterizations substantially validate our theoretical framework and show relatively good performance of the centimeter-scale achromatic multi-level diffractive lenses with a super broad bandwidth in optical wavelengths (400–1100 nm). After comparing with conventional refractive lens, this achromatic lens shows significant advantages in white-light imaging performance, implying a new strategy in developing practical planar optical devices. 

/pdf/large-scale-achromatic-flat-lens-by-light-frequency-domain-3pe6uomm.pdf

Large-scale achromatic flat lens by light frequency-domain coherence optimization

Metasurface-empowered optical cryptography

Active wavefronts control with graphene-functionalized terahertz Metasurfaces

Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics, metasurfaces, and biosensors, just to name a few. Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies. However, fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing, such as those utilizing focused beams of photons, electrons, or ions. In this work, we provide a solution toward wafer-scale, arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography (IL) and grayscale-patterned secondary exposure (SE). Employed after the high-throughput IL, a SE with patterned intensity distribution spatially modulates the dimensions of photoresist nanostructures. Based on this approach, we successfully fabricated 4-inch wafer-scale nanogratings with uniform linewidths of <5% variation, using grayscale-patterned SE to compensate for the linewidth difference caused by the Gaussian distribution of the laser beams in the IL. Besides, we also demonstrated a wafer-scale structural color painting by spatially modulating the filling ratio to achieve gradient grayscale color using SE. 

/pdf/spatial-modulation-of-nanopattern-dimensions-by-combining-ctpf0cbe.pdf

Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

Metasurfaces, based on subwavelength structuring, provide a versatile platform for wavefront manipulation in an ultrathin form factor. The manufacturing of metasurfaces, however, generally requires...

Large-Scale Metasurfaces Based on Grayscale Nanosphere Lithography

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Large-Scale Metasurfaces Based on Grayscale Nanosphere Lithography