André Reck
Dresden University of Technology
8 Papers
André Reck is an academic researcher from Dresden University of Technology. The author has contributed to research in topics: Fatigue limit & Chemistry. The author has an hindex of 3, co-authored 4 publications.
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Papers
Machine Learning Assisted Statistical Variation Analysis of Ferroelectric Transistors: From Experimental Metrology to Predictive Modeling
Gi Hwan Choe,Prasanna Venkatesan Ravindran,Anni Lu,Jae Hur,Maximilian Lederer,André Reck,S. Lombardo,Nashrah Afroze,Josh Kacher,Asif Islam Khan,Shimeng Yu +10 more
- 12 Jun 2022
TL;DR: A novel machine learning (ML)-assisted methodology to analyze the variability of ferroelectric field-effect transistor (FeFET) with raw data from the metrology and trained a neural network using the polarization maps as inputs and the high/low threshold voltage, on-state current, and subthreshold slope as outputs.
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Machine Learning-Assisted Statistical Variation Analysis of Ferroelectric Transistor: From Experimental Metrology to Adaptive Modeling
Gi Hwan Choe,Prasanna Venkatesan Ravindran,Jae Hur,Maximilian Lederer,André Reck,Asif Islam Khan,Shimeng Yu +6 more
TL;DR: In this paper , a machine learning-assisted approach is proposed for investigating the variability of ferroelectric field-effect transistor (FeFET) to shorten the loop of technology pathfinding.
4
Multielectrode Arrays at Wafer-Level for Miniaturized Sensors Applications: Electrochemical Growth of Ag/AgCl Reference Electrodes
TL;DR: In this paper , a range of miniaturized Ag/AgCl reference electrodes with various layouts were successfully fabricated on wafer-level silicon-based substrates with metallic intermediate layers by precisely controlling the electrochemical deposition of Ag, followed by electrochemical chlorination of the deposited Ag layer.
2
300 mm CMOS-compatible superconducting HfN and ZrN thin films for quantum applications
Roman Potjan,Marcus Wislicenus,Oliver Ostien,Raik Hoffmann,Maximilian Lederer,André Reck,Jennifer Emara,L. Roy,Benjamin Lilienthal-Uhlig,J. Wosnitza +9 more
TL;DR: Superconducting HfN and ZrN thin films fabricated on 300 mm CMOS equipment exhibit high critical temperatures and coherence lengths, paving the way for scalable integration into quantum systems.
1
Cyclic deformation characteristics of the metastable β-type Ti–40Nb alloy
André Reck,Stefan Pilz,Stefan Pilz,Martin Kuczyk,Annett Gebert,Martina Zimmermann,Martina Zimmermann +6 more
TL;DR: In this article, the cyclic deformation behavior of a new metastable β-type Ti-40Nb alloy (wt%) in two different microstructural conditions was investigated. But, the results revealed significant differences in the deformation behaviour and a higher fatigue strength for the aged condition.