3D printing of nanowires using Focused Electron Beam Induced Deposition (FEBID) enables the direct-write fabrication of complex 3D objects on almost any substrate surface. The physical properties of such freestanding structures are determined by the dimensions of constituent nanowires. However, little knowledge is available about the exact shape of the nanowires, which is indispensable for calculations and simulations as well as for optimization in applications. In this study, we evaluate the thicknesses and widths of freestanding segments as a function of the inclination angles, primary electron energy, beam currents, and precursor flux. Furthermore, the cross-sectional shape, the cross-sectional area, and the evolution along the length of the wire are investigated. Basing on detailed scanning electron microscopy measurements and Monte Carlo/Finite Differences simulations, the effects that the growth parameters have on the segment growth are elucidated. The results shed light on the growth evolution of the structures and form the basis for future studies on the fabrication of high-precision, arbitrarily shaped nanowires.

Shape evolution and growth mechanisms of 3D-printed nanowires

Directly 3D-printed metal microstructures could enable hybrid micromanufacturing, combining conventional micromanufacturing with additive micromanufacturing (µAM). The microstructure’s material properties, including the electrical resistivity, are of decisive importance for a wide range of applications in microelectronics, high-frequency communication, and biomedical engineering. In this work, we present a room-temperature process for µAM of gold structures based on local electrodeposition. We demonstrate control of the electrodeposition process by regulating the precursor species supply rate through air pressure and by regulating the reaction rate through the electrodeposition potential. We 3D printed complex gold microscale structures and characterized the resistivity of the printed gold by developing hybrid devices with integrated four-point probe measurement capability. Additionally, we printed copper microwires, building on a previously shown copper µAM process, and characterized the copper resistivity. We demonstrate near-bulk resistivity values of 65 nΩ·m (about 2.5 times higher than bulk) and 19 nΩ·m (only 10% higher than bulk) for the gold and copper wires, respectively, without post-treatment. Microstructural analysis of the gold wires revealed a dense metal deposit free of voids. Finally, we printed gold structures on a pre-patterned substrate, paving the way to hybrid devices in which additive micromanufacturing is combined with existing micromanufacturing techniques. 

Direct 3D microprinting of highly conductive gold structures via localized electrodeposition

High-fidelity 3D printing of nanoscale objects is an increasing relevant but challenging task. Among the few fabrication techniques, focused electron beam induced deposition (FEBID) has demonstrated its high potential due to its direct-write character, nanoscale capabilities in 3D space and a very high design flexibility. A limitation, however, is the low fabrication speed, which often restricts 3D-FEBID for the fabrication of single objects. In this study, we approach that challenge by reducing the substrate temperatures with a homemade Peltier stage and investigate the effects on Pt based 3D deposits in a temperature range of 5–30 °C. The findings reveal a volume growth rate boost up to a factor of 5.6, while the shape fidelity in 3D space is maintained. From a materials point of view, the internal nanogranular composition is practically unaffected down to 10 °C, followed by a slight grain size increase for even lower temperatures. The study is complemented by a comprehensive discussion about the growth mechanism for a more general picture. The combined findings demonstrate that FEBID on low substrate temperatures is not only much faster, but practically free of drawbacks during high fidelity 3D nanofabrication.

https://www.mdpi.com/2079-4991/11/6/1527/pdf

FEBID 3D-Nanoprinting at Low Substrate Temperatures: Pushing the Speed While Keeping the Quality.

https://www.dora.lib4ri.ch/empa/islandora/object/empa%3A34509/datastream/PDF/Sch%C3%BCrch-2023-Direct_3D_microprinting_of_highly-%28published_version%29.pdf

Direct 3d Microprinting of Highly Conductive Gold Structures Via Localized Electrodeposition

Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes down to the sub-20 nm range. While indispensably needed for some concepts (e.g., 3D nano-plasmonics), the final applications can also be limited due to low mechanical rigidity, and thermal- or electric conductivities. To optimize these properties, without changing the overall 3D architecture, a controlled method for tuning individual branch diameters is desirable. Following this motivation, here, we introduce on-purpose beam blurring for controlled upward scaling and study the behavior at different inclination angles. The study reveals a massive boost in growth efficiencies up to a factor of five and the strong delay of unwanted proximal growth. In doing so, this work expands the design flexibility of this technology.

https://www.mdpi.com/2072-666X/12/2/115/pdf

Expanding 3D Nanoprinting Performance by Blurring the Electron Beam

The direct-write fabrication of freestanding nanoantennas for plasmonic applications is a challenging task, as demands for overall morphologies, nanoscale features, and material qualities are very high. Within the small pool of capable technologies, three-dimensional (3D) nanoprinting via focused electron beam-induced deposition (FEBID) is a promising candidate due to its design flexibility. As FEBID materials notoriously suffer from high carbon contents, the chemical postgrowth transfer into pure metals is indispensably needed, which can severely harm or even destroy FEBID-based 3D nanoarchitectures. Following this challenge, we first dissect FEBID growth characteristics and then combine individual advantages by an advanced patterning approach. This allows the direct-write fabrication of high-fidelity shapes with nanoscale features in the sub-10 nm range, which allow a shape-stable chemical transfer into plasmonically active Au nanoantennas. The here-introduced strategy is a generic approach toward more complex 3D architectures for future applications in the field of 3D plasmonics.

High-Fidelity 3D Nanoprinting of Plasmonic Gold Nanoantennas

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High-Fidelity 3D Nanoprinting of Plasmonic Gold Nanoantennas