Anomalous x-ray scattering is employed for quantitative measurements of the Ge composition profile in islands on Si(001). The anomalous effect in SiGe is enhanced exploiting the dependence of the complex atomic form factors on the momentum transfer. Comparing the intensity ratios for x-ray energies below and close to the K edge of Ge at various Bragg reflections in the grazing incidence diffraction setup, the sensitivity for the Ge profile is considerably enhanced. The method is demonstrated for SiGe dome-shaped islands grown on Si(001). It is found that the composition inside the island changes rather abruptly, whereas the lattice parameter relaxes continuously.

Direct determination of strain and composition profiles in SiGe islands by anomalous x-Ray diffraction at high momentum transfer.

Group IV photonics is on its way to be integrated with electronic circuits, making information transfer and processing faster and more energy efficient. Light sources, a critical component of photonic integrated circuits, are still in development. Here, we compare multi-quantum-well (MQW) light-emitting diodes (LEDs) with Ge0.915Sn0.085 wells and Si0.1Ge0.8Sn0.1 barriers to a reference Ge0.915Sn0.085 homojunction LED. Material properties as well as band structure calculations are discussed, followed by optical investigations. Electroluminescence spectra acquired at various temperatures indicate effective carrier confinement for electrons and holes in the GeSn quantum wells and confirm the excellent performance of GeSn/SiGeSn MQW light emitters.

Short-wave infrared LEDs from GeSn/SiGeSn multiple quantum wells

We demonstrate that Ge can be selectively grown on Si(100) through openings in a SiO2 nanotemplate by solid source molecular beam epitaxy. The selectivity relies on the thermal instability of GeO and SiO near 650 °C. Ge islands grow in the template windows and coalesce on top of the template, forming an epitaxial lateral overgrowth (ELO) layer. Cross-sectional transmission electron microscopy images show that the Ge seeds and the ELO layer are free of threading dislocations. Only stacking faults are generated but terminate within 70 nm of the Ge–Si interface, while twins along {111} planes are observed in the ELO layer. The threading-dislocation-free Ge seeds and ELO layer are attributed to epitaxial necking as well as Ge–Si intermixing at the interface.

Selective growth of Ge on Si(100) through vias of SiO2 nanotemplate using solid source molecular beam epitaxy

Intense photoluminescence (PL) originating from single layers of germanium hut clusters grown on silicon (001) is investigated using PL spectroscopy. We propose that the luminescence originates from phononless recombination within a spatially indirect, type-II neighboring confinement structure. Enhanced no-phonon (NP) luminescence is attributed to exciton localization at the Ge/Si interfaces. The PL intensity is sensitive to the growth temperature during interface formation, as well as to post-growth thermal annealing, illustrating the influence of atomic-level Si–Ge intermixing on exciton localization and NP enhancement.

Photoluminescence investigation of phononless radiative recombination and thermal-stability of germanium hut clusters on silicon(001)

During the last decade, Si/Si1−xGex heterostructures have emerged as a viable system for use in CMOS technology with the recent industrial production of heterojunction bipolar transistor-based integrated circuits. However, many key problems have to be solved to further expand the capabilities of this system to other more attractive devices. This paper gives a comprehensive review of the progress achieved during the last few years in the understanding of some fundamental growth mechanisms. The discrepancies between classical theories (in the framework of continuum elasticity) and experimental results are also specially addressed. In particular, the major role played by kinetics in the morphological evolution of layers is particularly emphasized. Starting from the unexpected differences in Si1−xGex morphological evolution when deposited on (001) and on (111), our review then focuses on: (1) the strain control and adjustment (from fully strained to fully relaxed 2D and 3D nanostructures)—in particular, some original examples of local CBED stress measurements are presented; (2) the nucleation, growth, and self-assembly processes, using self-patterned template layers and surfactant-mediated growth; (3) the doping processes (using B for type p and Sb for type n) and the limitations induced by dopant redistribution during and after growth due to diffusion, segregation, and desorption. The final section will briefly address some relevant optical properties of Si1−xGex strained layers using special growth processes.

/pdf/sige-nanostructures-new-insights-into-growth-processes-pb7ucy3ql9.pdf

SiGe nanostructures: new insights into growth processes

In this article we study the electroluminescence of p-i-n diode structures with Ge dots consisting of coherent three-dimensional small (pyramids) and larger (dome) islands. The Ge dots are formed through strain-induced islanding. The diode structures, including one layer with Ge dots, were deposited on Si mesas with variable areas in order to study the influence of limited area deposition on self-assembling. It was observed that the reduction of deposited area improves island uniformity. The combined analysis of island distribution and electroluminescence spectra has lead to the conclusion that domes in small diodes have a smaller Si content or are less relaxed than domes in larger diodes. The diodes are found to emit up to room temperature near the optical communication wavelength of 1.3 microns.

/pdf/size-distribution-and-electroluminescence-of-self-assembled-x1lao6k33h.pdf

Size distribution and electroluminescence of self-assembled Ge dots

Room-temperature light-emitting diodes with Ge islands

The electroluminescence (EL) of thick fully strained SiGe layers is investigated in order to clarify the recombination mechanisms. In the investigated temperature range of 20– 80 K and for SiGe thickness of 70– 450 nm an electron–hole plasma (EHP) is observed even at low current densities of 1 A cm −2 . In SiGe-based quantum devices the EHP condition is expected to be attained at even lower injection levels. We used the band filling model for EHP to extract the renormalized gap of SiGe in dependence on the plasma density by performing a line shape analysis of EL spectra. The results were compared with the theoretical prediction. Based on this analysis as well as on measurements and modelling of the spectral photocurrent and the external quantum efficiency, we were able to evaluate parameters of recombination transitions for EHP in SiGe. Above 200 K there is an important contribution to EL from the silicon regions. For a better evaluation of the SiGe contribution, we compared EL of SiGe diodes with EL of pure silicon diodes.

Electroluminescence study on electron hole plasma in strained SiGe epitaxial layers

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Size distribution and electroluminescence of self-assembled Ge dots

Room-temperature light-emitting diodes with Ge islands

Electroluminescence study on electron hole plasma in strained SiGe epitaxial layers