The influence of glow discharge nitriding, oxynitriding and carbonitriding on surface modification of Ti–1Al–1Mn titanium alloy

Plasma-based low-energy nitrogen ion implantation, including plasma source ion nitriding/carburizing and plasma source low-energy ion enhanced deposition, has emerged as a low-temperature surface engineering technique for metal and alloy. In this paper, the pure metal Ti samples have been modified by the plasma source ion nitriding process at a process temperature of 700 °C for a processing time of 4 h. The nitrided Ti surfaces were constructed of a continuous and dense Ti2N compound layer about 2 μm thick and a 7–8 μm diffused layer. During tribological test on a ball on disk tribometer against the Si3N4 ceramic counterface, a low friction coefficient of about 0.3 and the faint wear volume were obtained for the nitrided Ti samples. The cyclic polarization curves of the nitrided Ti samples in 3.5% and 6.0% NaCl solutions showed that the improved pitting corrosion resistance with an increase of corrosion potential and a decrease of passive current, compared with that of the unnitrided Ti sample. The plasma source ion nitriding of the Ti samples provided the engineering surfaces for the functional applications with the combined improvement in wear and corrosion resistance.

Wear and corrosion properties of plasma-based low-energy nitrogen ion implanted titanium

The invention relates to a method for producing single-wall carbon nanotubes. The method of the invention comprises the steps of (a) providing a plasma torch having a plasma tube with a plasma-discharging end; (b) feeding an inert gas through the plasma tube to form a primary plasma; (c) contacting a carbon-containing substance and a metal catalyst with the primary plasma at the plasma-discharging end of the plasma tube, to form a secondary plasma containing atoms or molecules of carbon and atoms of the metal catalyst; and (d) condensing the atoms or molecules of carbon and the atoms of the metal catalyst to form single-wall carbon nanotubes. Alternatively, steps (b) and (c) can be carried out by feeding an inert gas and an inorganic metal catalyst through the plasma tube to form a primary plasma containing atoms of the inorganic metal catalyst and contacting a carbon-containing substance with the primary plasma at the plasma-discharging end of the plasma tube, to form a secondary plasma containing atoms or molecules of carbon and the atoms of metal catalyst. An apparatus for carrying out the method according to the invention is also disclosed.

Method and apparatus for producing single-wall carbon nanotubes

A porous-coated Ti-6Al-4V implant was fabricated by electrical resistance sintering, using 480 μF capacitance and 1.5 kJ input energy. X-ray photoelectron spectroscopy (XPS) was used to study the surface characteristics of the implant material before and after sintering. There were substantial differences in the content of O and N between as-received atomized Ti-6Al-4V powders and the sintered prototype implant, which indicates that electrical resistance sintering alters the surface composition of Ti-6Al-4V. Whereas the surface of atomized Ti-6Al-4V powders was primarily TiO2, the surface of the implant consisted of a complex of titanium oxides as well as small amounts of titanium carbide and nitride. It is proposed that the electrical resistance sintering process consists of five stages: stage I – electronic breakdown of oxide film and heat accumulation at the metal-oxide interface; stage II – physical breakdown of oxide film; stage III – neck formation and neck growth; stage IV – oxidation, nitriding, and carburizing; and stage V – heat dissipation. The fourth stage, during which the alloy repassivates, is responsible for the altered surface composition of the implant.

Mechanism of surface modification of a porous-coated Ti-6Al-4V implant fabricated by electrical resistance sintering

There is provided an apparatus for producing single-wall carbon nanotubes. The apparatus comprises a plasma torch having a plasma tube adapted to receive an inert gas and form an inert gas plasma; a feeder adapted to direct a carbon-containing substance and a metal catalyst towards said inert gas plasma so that the carbon-containing substance and the metal catalyst contact said inert gas plasma downstream of where said inert gas is introduced in said plasma tube, to thereby form a plasma comprising atoms or molecules of carbon and the atoms of said metal; and a condenser for condensing the atoms or molecules of carbon and the atoms of said metal to form single-wall carbon nanotubes.

Apparatus for producing single-wall carbon nanotubes

A compact surface electron cyclotron resonance (ECR) plasma source, developed at Institut National de la Recherche Scientifique (INRS)-Energie et Materiaux, has been used as a versatile surface treatment tool. The source has been operated with nitrogen for application to plasma assisted nitriding near room temperature. A negatively biased titanium target is immersed in the processing chamber (PC) plasma. The pulsed plasma diffuses from the ECR source across a transparent grid and fills the PC. The ions are accelerated and implanted into the Ti target. The electric field distribution in the PC, and therefore the uniformity of the implantation, was controlled using a highly transparent grounded grid. For a typical operating pressure of about 0.1–0.2 Pa, and with ~300W of microwave power coupled to the plasma source, a flat density profile with nc = 2.5 × 1015 m−3 (over a diameter > 0.07 m) was measured by a scanning Langmuir probe in the PC. The electron temperature was 6.5 eV, and it also had a flat profile. In these preliminary experiments, ion nitriding of titanium samples was achieved with 30 keV nitrogen ion implantation. The hardness of the Ti target surface changed from 3.4 GPa to 5.8 GPa following the implantation. The depth profile of the implanted ions, measured by the X-ray photoelectron spectroscopy technique, combined with the simulation results from the TRIM code suggests that ion-neutral collisions in the PC were not frequent enough to alter the ion energy distribution significantly.

Characterization of diffused ECR plasma—Application to pulsed plasma ion implantation of nitrogen in titanium

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Characterization of diffused ECR plasma—Application to pulsed plasma ion implantation of nitrogen in titanium